The development of new materials and their subsequent application depends on a fundamental understanding of their molecular structure, relating the structure to material properties and performance, and the bonding between atoms.
Atomic Resolution Microscopy
JEOL instrumentation is unmatched for atomic resolution imaging. The ultrastable electron column and high resolution of the ARM200F aberration-corrected TEM push materials research to new frontiers. The unrivaled raw data from the ARM200F demonstrate never-before-seen imaging resolution plus high spatial resolution for chemical analysis. The ARM200F features an all-new shielded electron column design that surpasses all other TEM designs today.
Biomaterials – Borrowing from Nature
Today’s materials science researchers are leading the way in fabricating newer, stronger materials based on those that occur in nature. Nacre, the iridescent, super strong material known as mother-of-pearl, is sectioned using Focused Ion Beam (FIB) and studied using SEM for properties that can contribute to developing stronger materials at MIT’s Institute for Soldier Nanotechnologies. A versatile JEOL analytical, field emission TEM, the JEM-3200FS, is used in multidisciplinary studies at Indiana University to develop self-assembled molecular layers and nanoparticles that mimic the self-assembly of viruses.
JEOL TEMs and SEMs have long been used to benefit advanced research as well as failure analysis. In the 1980s, a JEOL high resolution TEM validated the structure of C60 and helped lead to early discoveries in carbon nanotubes. Nobel prize winners, recipients of major research grants, and world-renowned scientists have used JEOL instruments in their advanced research.
Structural Imaging and Analysis
Microstructural information and surface/bulk chemical analyses are readily obtained from JEOL SEMs and Microprobes with state-of-the-art results. Elemental mapping and characterization of fine structures are routine for JEOL’s high performance FEG-SEMs, including the ultrahigh resolution analytical field emission JSM-7600F. Coatings, adhesives, layers, composites – all is revealed by the power of the SEM and Microprobe.
Versatile SEM/FIB tools, like the JEOL MultiBeam, allow simultaneous viewing, analysis, and micro milling functions, and serial slicing and sampling (S3) for monitoring, slicing, fabrication and reconstruction of specimens in 3D.
JEOL’s expertise in e-beam lithography expands the capability of the Field Emission SEM to allow for direct write patterning and gas-assisted e-beam lithography. In the 1960s, direct write e-beam was used for writing IC circuits on small wafers for a dedicated application. Now it is used in a myriad of applications from photonics and DNA filters to nano-fluidics, nano-gap patterns, and single electron transistors.
Difficult Sample Preparation
Pristine samples of all types of materials are easily prepared with JEOL ion beam tools. Hard, soft, magnetic, frozen, and composite materials are routinely cross sectioned with distortion-free results using the JEOL argon beam Cross Section Polisher or JEOL Multibeam SEM-FIB. Experiments involving variations in specimen temperature and ambient gas pressure, specimen straining, and changes in electrical bias or magnetic field can all be accomplished with special optional stages and feedthroughs.