JEOL USA Press Releases

Peabody, Mass., May 19, 2006 -- JEOL, the leading manufacturer of e-beam lithography tools since 1967, announces the introduction of a new high precision direct write e-beam lithography system. The new JBX-6300FS is a spot beam, vector scan, step and repeat lithography system designed for high volume direct patterning on wafers, and is capable of writing minimum line widths of 8nm. 2-inch to 200mm wafers can be accommodated, as well as parts and pieces. ...

Peabody, Mass., May 19, 2006 --  JEOL, the industry-leading manufacturer of high resolution Scanning Electron Microscopes (SEMs), will showcase its automated, 360 degree wafer edge review SEM in Booth 1101 in the South Hall at Semicon West 2006, Moscone Center, San Francisco. The JEOL JWS-2000 (200mm) and JWS-3000 (200/300mm) are the only wafer edge review SEMs that allow pinpoint inspection at any position on the circumference of the 200mm or 300mm wafer. A unique high ...

Peabody, Mass., May 17, 2006 --  JEOL USA, a leading manufacturer of electron microscopes and analytical instruments, introduces a new ultra-high resolution Field Emission Scanning Electron Microscope (SEM) with advanced optics that clearly reveal intricate surface details during observation of nano structures of medical, biological, materials science, and semiconductor samples. Unique in-lens performance with semi-in lens advantages The performance and stability of the new JSM-7500F allows specimens to be easily observed at magnifications up to ...