New JEOL E-Beam Lithography System to Enhance Quantum NanoFab Capabilities
May 5, 2015 - Peabody, MA -- A state-of-the-art JEOL e-beam lithography system will soon be a new resource for quantum information science researchers that utilize the cutting-edge facilities at the University of Waterloo Quantum NanoFab in Waterloo, Ontario. The JEOL JBX-6300FS e-beam system will be used to write circuitry patterns at very high resolution and linewidths as small as 8nm. With accelerating voltage capability to 100kV, high resolution patterns can be written on ...