JEOL USA Press Releases

May 16, 2017 (Peabody, Mass.) -- Since 1967, JEOL has been the industry leader in Electron Beam Lithography design and manufacturing. Now the company enters its 51st year in this field with the introduction of a new high throughput spot beam direct write system, the JBX-8100FS. This new generation of e-beam introduces the capability of writing ultrafine patterns at a high rate of speed directly onto substrates with minimum idle time during the exposure process. ...

Ultrahigh resolution imaging of large samples in their native state May 11, 2017 -- Peabody, MA JEOL USA introduces a new Scanning Electron Microscope (SEM) that combines the performance of a Field Emission SEM with the simplicity of the JEOL InTouchScope SEM series. The new JSM-IT300HR features exceptional image fidelity at any kV with a high brightness, long life emitter. Offering higher resolution and magnification than ever before in this series, the IT300HR greatly enhances surface ...