JEOL USA Press Releases

July 30, 2008 (Peabody, Mass.) -- From the exhibition hall at the 2008 Microscopy and Microanalysis Conference in Albuquerque, New Mexico, JEOL USA will demonstrate – via remote operation – three of its more than 30 JEOL TEMs currently using Sirius™ Remote TEM software and internet or wireless connections. Visitors to the booth will be able to perform real-time operation of the JEM-2200FS Aberration-corrected TEMs at Oak Ridge National Laboratory in Tennessee and Lehigh ...

July 31, 2008 (Peabody, Mass.) -- JEOL USA will demonstrate a new high throughput Thermal Field Emission (FEG) Scanning Electron Microscope (SEM), the JSM-7600F, at M&M 2008 in Albuquerque, New Mexico in its booth #1027. Featuring the highest beam current available on any FEG SEM, the JSM-7600F integrates a semi-in-lens objective lens with an in-lens thermal electron gun, providing superior imaging of nonconductive samples that traditionally charge, such as photomasks, ceramics, and glass. This ...

July 30, 2008 (Peabody, Mass.) -- JEOL USA will demonstrate both of its new MultiBeam SEM/FIB instruments in a special exhibit area dedicated to its ion beam “power tools” at M&M 2008. The LaB6 model, the JIB-4500 MultiBeam, was introduced in December 2007 and has already gained wide acceptance, with recent installations at nanotechnology research centers at Boston College and the University of Southern California. A new Field Emission MultiBeam, the model JIB-4600F, will debut ...

July 28, 2008 (Peabody, Mass.) -- JEOL USA will host a tutorial session at M&M 2008 in conjunction with Oak Ridge National Laboratory (ORNL) and Protochips to introduce PRISM – Practical Remote In Situ Microscopy. The PRISM tutorial will be held on Monday, August 4, 2008 at the Microscopy & Microanalysis (M&M) Exhibit in Albuquerque, New Mexico in the JEOL booth #1027 at 5:30 p.m. PRISM is a technique made possible by the remote operation ...

July 28, 2008 (Peabody, MA) -- JEOL, the global leader in electron microscopy for nearly 60 years, will demonstrate a variety of new software packages for its 120kV to 300kV series of Transmission Electron Microscopes (TEMs) in booth #1027 at the M&M 2008 Microscopy and Microanalysis exhibit in Albuquerque, New Mexico from August 4-7. Exploring the frontiers of electron microscopy, scientists using JEOL TEMs accelerate research advances and boost productivity with a suite of recently ...

See the new JEOL lineup: Power Tools for Microscopy and Sample Processing