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JEOL Electron Beam Lithography

We offer the widest range of e-beam tools for mask, reticle, and direct-write lithography, from high volume production to advanced research and development of NIL, photonic crystals, and sub-10 nanometer linewidths. Whether your applications are for next generation and beyond, production of ultra-high accuracy reticles and FET devices, ASIC fabrication, or direct pattern lithography on wafers, JEOL has a solution. We also offer an FEG SEM that is expandable for simple lithography and research applications.

Available Models

  Emitter Accelerating Voltage Min. Beam Size Wafer Size Beam Shape Deflection
JBX-3050MV LaB6 single crystal 50 kV   Substrate Size:
6 inch mask 
 Variable shaped Vector scan
JBX-6300FS ZrO/W (Schottky) 100 kV / 50 kV / 25 kV 2nm Up to 200mm wafer Spot Vector scan
JBX-9500FS ZrO/W (Schottky) 100 kV / 50 kV 4nm (100 kV)
7nm (50 kV)
Up to 300mm wafer Spot Vector scan