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   PRODUCTS : Semiconductor Equipment : Electron Beam Lithography : JBX-5500FS  
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JBX-5500FS Electron Beam Lithography System

Compact and Cost Effective New Direct Write E-Beam System

JBX-5500FSThe new JBX-5500FS is a cost-effective, high resolution direct write tool that is PC-controlled and simple to use. A spot beam, vector scan system, the JBX-5500FS writes patterns at a minimum line width of 10nm at 50kV.

The JBX-5500FS can achieve writing accuracies in two separate modes:

  • High Resolution Mode: Overlay accuracy of < 40nm (3 sigma) can be achieved at 50kV.
  • High Speed Mode: High speed mode allows 1mm fields at 50kV or 2mm at 25kV.

The JBX-5500FS can accept parts/pieces and wafers up to 100mm substrates via a single wafer manual loader.

  
JBX-5500FS Key Product Features
Exposure Method Vector scan, spot beam
Accelerating Voltage 25 kV / 50 kV
Gun Source Thermal Field Emission
Minimum Beam Size 2nm, 5nm, 8nm
Maximum Field Size

High resolution mode:
  100µm x 100µm (50 kV)
  200µm x 200µm (25 kV)

High speed mode:
  1000µm x 1000µm (50 kV)
  2000µm x 2000µm (25 kV)

Substrate Size Maximum 100mm dia.
Beam Positioning DAC 18 Bit
  

 
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