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   PRODUCTS : Semiconductor Equipment : Wafer Inspection SEM : JWS-7855S  
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JWS-7855S Mask Observation Scanning Microscope

JWS-7855SThe JWS-7855S Mask Observation Scanning Microscope has a stable thermal field emission electron gun, high tilt angle stage and specimen handling mechanism for the observing of reticules. The JWS-7855S allows for a specimen to be tilted from 0° to 60° without changing the field of view or focus. The JWS-7855S can also rapidly change from 800 volts to 12,000 volts for superior EDS analysis.

  
JWS-7855S Key Product Features
Specimen Size up to 6 in. x 6.5mm thick
(specify when ordering)
Specimen holder (option) for 6 inch x 6.35t mask
for 5 inch x 2.29t mask
for 8 inch wafer
for 6 inch wafer
for cross section observation
for other masks

SEM Capability

Image resolution 6nm (at 1 kV accelerating voltage)
Magnification Area x100 - x200,000 (on display)
Accelerating Voltage 0.5 kV - 3 kV (10V step)
3 kV - 5 kV (100V step)
5 kV - 12 kV (1000V step)

Specimen Stage

Type 4-axis goniometer stage
Computer eucentric type
Movements X and Y: 200 mm
T (Tilt): -15° to 60°
R (Rotation): 360° endless
Z: Fixed
Positioning Accuracy ± 10 µm or better (X, Y movements only)

 

  

 
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