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  RESOURCES : Semiconductor Equipment : Documents & Downloads  
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JEOL USA Semiconductor Equipment Documents

Electron Beam Lithography

Last Modified 7/28/2007 8:51 PM
Created 7/28/2007 8:51 PM
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  Title Author Last Modified            
Fabrication of 5-7 nm wide etched lines in silicon using 100 keV electron-beam lithography and polymethylmetacrylate resist Wei Chen and Haroon Ahmed 7/29/2007 8:31 AM
Fabrication of Grating Patterns by E-Beam Lithography Ohki, Asari, Takemura, Isobe, Moriya 7/28/2007 9:43 PM
Fabrication of high performance microlenses for an integrated capillary channel electrochromatograph with fluorescence detection various 7/29/2007 10:05 AM
Fabrication of Nano-Structures using EB-Lithography and its Application to Long-Wavelength Quantum-Wire Lasers various 7/29/2007 9:58 AM
Fabrication of subwavelength, binary, antireflection surface-relief structures in the near infrared Wendt, Vawter, Smith, Warren 7/28/2007 11:17 PM
Gate technology for 70 nm metal-oxide-semiconductor field-effect transistors with ultrathin (<2 nm) oxides various 7/28/2007 11:19 PM
Georgia Tech's Microelectronics Center (MiRC) 7/29/2007 9:17 AM
High-purity, ultrahigh-resolution calixarene electron-beam negative resist Manako, Ochiai, Yamamoto, Teshima, Fujita, Nomura 7/28/2007 10:14 PM
High-Resolution Electron-Beam Lithography and Its Application to MOS Devices Yukinori Ochiai 7/28/2007 10:31 PM
HSQ application for sub-10 nm scale lithography Piotr Jedrasik 7/29/2007 9:01 AM

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