MultiBeam, a new high performance SEM and micro milling FIB, combines the most popular LaB₆ electron column in the world with real time milling and monitoring capability. The JIB-4500 MultiBeam delivers high throughput and increased productivity with simultaneous viewing, analysis, and micro milling functions for a variety of applications.

Versatility

• Low vacuum operation for imaging non-conductive specimens without coating or alteration
• A gas injection system for etching and deposition
• A large stage for up to 150 mm samples
• A multiple port design for all your analytical needs

Productivity

• Serial slicing and sampling (S³) for monitoring, slicing, fabrication and reconstructing 3D images
• Maximum milling current for high throughput
• Standard airlock system for fast sample loading

Stability

• Provides stable imaging for milling / monitoring over extended periods of time
• High throughput milling of large areas (max milling current 30 nA)
• 5-axis eucentric goniometer stage

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FIB

Ion Source	Ga liquid metal ion source
Resolution	5nm @ at 30kV
Accelerating Voltage	1 to 30kV (in steps)
Magnification	30x (for wide view) 100X to 300,000X
Maximum Beam Current	30nA (at 30kV)

SEM

Beam Source	LaB6
Resolution	2.5nm @ at 30kV
Accelerating Voltage	0.3 to 30kV (in steps)
Magnification	5X to 300,000X
Maximum Beam Current	1,000nA (at 30kV)
Goniometer Stage	X: 76mm Y: 76mm Z: 5 to 48mm Z' for eucentric point adjustment T: -10° to 90°; R: 360° endless
Vacuum  Pump	SIP (x2), TMP/RP (x2)
Standard Features	Low vacuum (LV) Backscatter detector (BEI) Gas injection unit (1)