JEOL Resourceshttps://www.jeolusa.com/RESOURCES/Electron-Optics/Documents-DownloadsA Note on Magnificationhttps://www.jeolusa.com/RESOURCES/Electron-Optics/Documents-Downloads/a-note-on-magnificationIT200Mon, 02 Nov 2020 12:04:09 GMTSEM manufacturers can choose different output sizes for their images, making magnification a very deceptive number when comparing SEM micrographs from different SEM manufacturers. Because of this fact, the best way to compare images is to compare the length of the micron bar or field of view.<h4>JEOL Technical Note</h4> <p>Magnification is defined as the ratio of the size of the rastered area on the sample to the size of the rastered area of the output, as is shown in Figure 1. Traditionally, the output size was defined as a Polaroid 4x5 film size by all vendors and results were easy to compare. However, since images are now collected digitally and can be output at various sizes, this “output size” is ill-defined. SEM manufacturers can choose different output sizes for their images, making magnification a very deceptive number when comparing SEM micrographs from different SEM manufacturers. Because of this fact, the best way to compare images is to compare the length of the micron bar or field of view.</p> <p class="caption" style="text-align: center;"><img alt="" src="https://jeolusa.s3.amazonaws.com/resources_eo/A%20Note%20on%20Magnification%20fig1.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=qwBAKbK5vdFXBnMuqKvDTHaPuWU%3D" /><br /> <strong>Figure 1</strong>: A small raster on the specimen leads to a large magnification for the same output size.</p> <p>The SEM images of hematite from two different SEM manufacturers below illustrate this point. The left image is from a JEOL SEM and has a magnification labeled as 75,000 X with a 100 nm micron bar. The right image is from another SEM manufacturer and has a magnification labeled as 150,000 X with the exact same length 100 nm scale bar (highlighted in red). This shows that the enlargement of the sample is identical in the two images, even though the magnification value stated by the other SEM manufacturer is twice that of the JEOL image.</p> <p class="caption" style="text-align: center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/A%20Note%20on%20Magnification%20fig2.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=ee9XnW4z%2FNODAGjnIrjYn%2B%2Bz9%2Fg%3D" /><br /> <strong>Figure 2</strong>: SEM images of hematite with the same enlargement of the sample despite having different magnification values stated. Left image: From a JEOL SEM Right image: From a different SEM manufacturer</p> Air Isolated Transfer Systemhttps://www.jeolusa.com/RESOURCES/Electron-Optics/Documents-Downloads/air-isolated-transfer-systemIT200Mon, 02 Nov 2020 12:16:34 GMTThere are a number of applications where scientists and engineers are faced with air or moisture sensitive samples that require imaging and analysis using a scanning electron microscope (SEM). Applications include: components in rechargeable batteries, fuel cells, and catalysts among others. Any exposure to oxygen or moisture in the air can completely alter or destroy the structure of these highly reactive materials. JEOL has built a special air-lock system that can handle the transfer of air-sensitive specimens to be imaged in the SEM without atmospheric exposure.<h4>Latest Innovation in our FE SEMs</h4> <h3>SMART – POWERFUL – FLEXIBLE</h3> <p>There are a number of applications where scientists and engineers are faced with air or moisture sensitive samples that require imaging and analysis using a scanning electron microscope (SEM). Applications include: components in rechargeable batteries, fuel cells, and catalysts among others. Any exposure to oxygen or moisture in the air can completely alter or destroy the structure of these highly reactive materials. JEOL has built a special air-lock system that can handle the transfer of air-sensitive specimens to be imaged in the SEM without atmospheric exposure.</p> <p class="caption" style="text-align: center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Air%20Isolated%20Transfer%20System%201.jpg?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=xkpdwzMtMpoQzXu0bEdfuNq5TUI%3D" /><br /> The sample can be prepared, mounted on the holder, and covered with a cap while inside a glove box. The cap seals and isolates the sample from the environment.</p> <p class="caption" style="text-align: center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Air%20Isolated%20Transfer%20System%202.jpg?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=pNIu1zuAhMeq0w%2FJQiRX3%2Bm9R%2Fg%3D" /><br /> The sample holder (w/cap) is then removed from the glovebox and transferred into the load lock of the SEM. After the airlock is evacuated, the user can open the cap and put the sample into the FE-SEM without air exposure.</p> Aperture Angle Control Lenshttps://www.jeolusa.com/RESOURCES/Electron-Optics/Documents-Downloads/aperture-angle-control-lensIT800Mon, 02 Nov 2020 12:32:11 GMTThe ability to increase the probe current for fast microanalysis, while still maintaining a small spot size and small volume of excitation for high resolution, has been the holy grail of microanalysis in SEM. One of the unique features of JEOL’s FE-SEMs is the patented Aperture Angle Control Lens (ACL). This lens automatically optimizes for both high resolution imaging at low probe currents and high spatial resolution X-ray analysis at high probe currents with a seamless transition between the two.<h4>JEOL FE-SEM – Innovative Design</h4> <h3>SMART – POWERFUL – FLEXIBLE</h3> <p>The ability to increase the probe current for fast microanalysis, while still maintaining a small spot size and small volume of excitation for high resolution, has been the holy grail of microanalysis in SEM. One of the unique features of JEOL’s FE-SEMs is the patented Aperture Angle Control Lens (ACL). This lens automatically optimizes for both high resolution imaging at low probe currents and high spatial resolution X-ray analysis at high probe currents with a seamless transition between the two. This is essential for rapid analysis and optimized image quality and is particularly true for low kV microanalysis. The ACL works by taking into account effects of all aberrations (such as spherical aberration and diffraction limitations) on spot size and optimizing the convergence angle accordingly in an automatic fashion.</p> <p class="caption" style="text-align: center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Aperture%20Angle%20Control%20Lens%201.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=56JfhP6Ry9Li%2BZMAxfH0O2aEtG0%3D" /><br /> <strong>Figure 1</strong>: Beam current density on a Gaussian plane. ACL optimization at high beam currents for (a) image resolution, and (b) analytical resolution. Nano gold images and EDS analysis completed at 5 kV, 20kX, and 73 nA.</p> <p>When the SEM is optimized for the smallest spot size (largest convergence angle) there is some beam tailing that produces X-rays from areas “not in the spot”. For low beam current applications this is insignificant. The best analytical data comes from the smallest convergence angle. Therefore, when the ACL is optimized for image resolution, the resulting high current image (large convergence angle) has somewhat ‘hazy’ background but shows great resolution. However, when the ACL is optimized for analytical work the ultimate resolution is slightly decreased, yet the analytical signal is no longer affected by the beam tailing resulting in smaller analytical signal delocalization (Figure 1).</p> <p>The automatic optimization of the ACL maintains high resolution imaging at a wide range of accelerating voltages and probe currents, from a few picoamps to hundreds of nanoamps. This beam resolution allows very fast acquisition (using high beam current) of EDS or WDS data at low kV with high spatial resolution.</p> <p class="caption" style="text-align: center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Aperture%20Angle%20Control%20Lens%202.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=akuyudLp3M6XMnDLaIedPWu%2BDMo%3D" /><br /> <strong>Figure 2</strong>: EDS map of nickel pillars on ITO which has sub-25nm resolution. The map was taken at 8kV with 5 nA of beam current.</p> <p>Implementation of the ACL function allows collection of very fast EDS maps at high spatial resolution using low kVs. One such example is shown in Figure 2. This is an EDS map of nickel pillars on ITO with sub-25nm resolution. The map was collected at 8 kV using a beam current of 5 nA.</p> <p>The ability to deliver high beam current also impacts WDS and CL (cathodoluminescence) analyses where large beam currents are needed for sufficient signal to noise collection. In the JEOL FE-SEMs, the ability of the ACL to keep the spot size small when the beam current is high results in efficient WDS mapping with high spatial resolution even at lower kV's. This is also true for CL analysis – high spatial resolution of CL collection requires a combination of high current/low voltage/small spot size.</p> <p>Shown in Figure 3 is an example of slip planes in diamond imaged with panchromatic KE Centaurus CL detector at 2 kV.</p> <p class="caption" style="text-align: center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Aperture%20Angle%20Control%20Lens%203.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=JKMVFD18wtaeusdXwPVsfM6TAwY%3D" /><br /> <strong>Figure 3</strong>: CL image of diamond grains collected with KE Centaurus CL.</p> Automated Imaging Solutions for SEMhttps://www.jeolusa.com/RESOURCES/Electron-Optics/Documents-Downloads/automated-imaging-solutions-for-semIT500Wed, 03 Jan 2024 16:50:43 GMTJEOL now offers both simple and advanced automation solutions, giving users the capability to develop protocols that fit their exact imaging needs. When paired with best-in- class AI-driven auto-function technology (auto focus, auto astigmatism correction, auto brightness/contrast), JEOL’s automation solutions are fast, reliable, reproducible, and applicable to a wide range of applications.<p>Automation of routine imaging in Scanning Electron Microscopy (SEM) has gained significant popularity over recent years. Automation provides users with additional levels of flexibility, including unattended and remote operation, as well as repeatability of their measurements. This ability maximizes productivity and sample throughput and significantly lowers the level of expertise required to proficiently operate SEMs. JEOL now offers both simple and advanced automation solutions, giving users the capability to develop protocols that fit their exact imaging needs. When paired with best-in- class AI-driven auto-function technology (auto focus, auto astigmatism correction, auto brightness/contrast), JEOL’s automation solutions are fast, reliable, reproducible, and applicable to a wide range of applications.</p> <h2>Simple Automation with Simple SEM</h2> <p>Simple SEM, JEOL’s latest advancement in automated imaging solutions, is a fully-integrated interface for creating and implementing imaging routines (Figure 1) without the need for programing experience. Users have the ability to develop custom automated workflows, including acquisition of SEM images and EDS data at a series of magnifications and locations on the sample surface and with varying operating conditions (accelerating voltage, probe current). Simply checking a box enables JEOL’s best-in-class auto-functions, with the added flexibility to control how often these functions are utilized within the workflow. Once routines are created, they are automatically saved and can be quickly implemented by simply selecting the area(s) on the sample that the user wants to characterize directly from a live image or ZeroMag view.</p> <p>Simple SEM is available as part of the standard software package on JEOL’s JSM-IT210, JSM-IT510 and JSM-IT710 SEM models.</p> <p style="text-align: center;"><img alt="Figure 1. Simple SEM is fully integrated within JEOL’s SEM control software, creating an intuitive environment for users to develop automation workflows without any need for programing experience." src="https://jeolusa.s3.amazonaws.com/resources_eo/Automated%20Imaging%20Solutions%20for%20SEM%2001.jpg?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=u5liPJoFw7B3RHGeMBBkk4ASV%2FA%3D" /><br /> <strong>Figure 1.</strong> Simple SEM is fully integrated within JEOL’s SEM control software, creating an intuitive environment for users to develop automation workflows without any need for programing experience.</p> <p><strong>Compatible Instruments:</strong> JSM-IT210, JSM-IT510, JSM-IT710HR<br /> <strong>Options:</strong> integration with JEOL EDS</p> <h2>Advanced Automation with Python and C#</h2> <p>For customers with more unique or challenging imaging demands, JEOL continues offers advanced external SEM control using Python or C# (Figure 2). This gives users the flexibility to fully develop and customize imaging protocols and interfaces, optimize acquisition at any operating conditions, automate image processing, and even integrate machine learning (Figure 3).</p> <p style="text-align: center;"><img alt="Figure 2. JEOL offers full external microscope control using Python and C#, allowing users to develop custom interfaces and automation programs. A full library of functions is available upon request." src="https://jeolusa.s3.amazonaws.com/resources_eo/Automated%20Imaging%20Solutions%20for%20SEM%2002.jpg?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=0xg%2FOlL0MI8DNbF6BFEiq3Iw1Pw%3D" /><br /> <strong>Figure 2.</strong> JEOL offers full external microscope control using Python and C#, allowing users to develop custom interfaces and automation programs. A full library of functions is available upon request.</p> <p style="text-align: center;"><img alt="Figure 3. External control allows users to develop custom interfaces and programs and integrate complex automation routines." src="https://jeolusa.s3.amazonaws.com/resources_eo/Automated%20Imaging%20Solutions%20for%20SEM%2003.jpg?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=B7phd2jhNxYfnxUBgKf%2FwClFhsc%3D" /><br /> <strong>Figure 3.</strong> External control allows users to develop custom interfaces and programs and integrate complex automation routines.</p> <p><em>External control with Python (3.5.1 or later) and C# available with all current JEOL SEM models. Additional compatible SEM models are available upon request.</em></p> Choose the Right SEM − Analysis Editionhttps://www.jeolusa.com/RESOURCES/Electron-Optics/Documents-Downloads/choose-the-right-sem-analysis-editionIT500Wed, 23 Jun 2021 13:12:28 GMTThe holy grail of nanoscale analysis with EDS is to quickly analyze any features which can be imaged in the SEM. However, for nanoscale features this is complicated by that fact that X-ray spatial resolution is typically larger than SEM imaging resolution. Figure 1 shows EDS maps from an integrated circuit cross section at 15kV and 6kV using a W SEM and an FE SEM, as well as the approximate X-ray signal depths at those voltages.<script> /* * rwdImageMaps jQuery plugin v1.6 * * Allows image maps to be used in a responsive design by recalculating the area coordinates to match the actual image size on load and window.resize * * Copyright (c) 2016 Matt Stow * https://github.com/stowball/jQuery-rwdImageMaps * http://mattstow.com * Licensed under the MIT license */ ; (function(a){ a.fn.rwdImageMaps=function(){ var c=this; var b=function(){ c.each(function(){ if(typeof(a(this).attr("usemap"))=="undefined"){ return} var e=this,d=a(e); a("<img />").on('load',function(){ var g="width",m="height",n=d.attr(g),j=d.attr(m); if(!n||!j){ var o=new Image(); o.src=d.attr("src"); if(!n){ n=o.width} if(!j){ j=o.height} } var f=d.width()/100,k=d.height()/100,i=d.attr("usemap").replace("#",""),l="coords"; a('map[name="'+i+'"]').find("area").each(function(){ var r=a(this); if(!r.data(l)){ r.data(l,r.attr(l))} var q=r.data(l).split(","),p=new Array(q.length); for(var h=0;h<p.length;++h){ if(h%2===0){ p[h]=parseInt(((q[h]/n)*100)*f)} else{ p[h]=parseInt(((q[h]/j)*100)*k)} } r.attr(l,p.toString())} )} ).attr("src",d.attr("src"))} )}; a(window).resize(b).trigger("resize"); return this} } )(jQuery); </script> <p>The holy grail of nanoscale analysis with EDS is to quickly analyze any features which can be imaged in the SEM. However, for nanoscale features this is complicated by that fact that X-ray spatial resolution is typically larger than SEM imaging resolution. Figure 1 shows EDS maps from an integrated circuit cross section at 15kV and 6kV using a W SEM and an FE SEM, as well as the approximate X-ray signal depths at those voltages.</p> <p style="text-align: center;"><strong><img alt="" class="img-responsive" data-gjs-type="image" draggable="true" loading="lazy" src="https://jeolusa.s3.amazonaws.com/resources_eo/JEOL%20Analysis%20SEM%20Comparisons%20FE.jpg?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=duF%2FCUCiG3RtDqxt%2BSWglqbOvhA%3D" usemap="#AnalysisMap" /><br /> Figure 1</strong>: EDS maps (same count rate/total time) from IC cross section at 15kV and 6kV using a W SEM and an FE SEM.</p> <p><map name="AnalysisMap"><area coords="337,4,770,148" href="https://fast.wistia.com/embed/channel/121ptvxx1o" shape="rect" /> <area coords="791,4,1230,151" href="https://fast.wistia.com/embed/channel/xe5ehq9rf7" shape="rect" /></map><script> $('img[usemap]').rwdImageMaps(); </script></p> <p>The W SEM is suitable for analysis of larger structures (hundreds of nm). Lowering kV allows for a smaller X-ray signal depth within the sample and thus higher X-ray spatial resolution (see the O and Al maps). If ultra-high X-ray spatial resolution is needed to resolve ~50nm layers (see the Ti maps), then an FE SEM is the best option, since FE emitters maintain a very small spot size even at low kV. Table 1 shows a comparison of some relevant parameters between thermionic tungsten emitters and Schottky field emission emitters.</p> <table class="table"> <tbody> <tr> <th>Parameters</th> <th>Thermionic Tungsten</th> <th>Schottky Field Emission</th> </tr> <tr> <td>Brightness (A cm<sup>-2</sup>sr<sup>-1</sup></td> <td>10<sup>5</sup></td> <td>10<sup>7</sup>-10<sup>8</sup></td> </tr> <tr> <td>Energy spread (eV)</td> <td>1-3</td> <td>0.5-0.6</td> </tr> <tr> <td>Life time</td> <td>~100 h</td> <td>~3 years or longer</td> </tr> </tbody> </table> <p style="text-align: center;"><strong>Table 1</strong>: A comparison of parameters between thermionic tungsten and Schottky field emission emitters.</p> Cryo Block for SEMhttps://www.jeolusa.com/RESOURCES/Electron-Optics/Documents-Downloads/cryo-block-for-semIT200Fri, 15 Sep 2023 11:00:00 GMTCryo-SEM imaging is a powerful tool in studying the structures of electron beam and vacuum sensitive materials. These materials include: fragile biological structures such as fungi, plants, cells, etc. as well as soft or volatile samples and even liquids. Cryo-SEM offers some clear advantages by rapidly freezing a sample prior to imaging, thus maintaining the sample as close as possible to its natural state. Long dehydration and chemical fixation steps can be avoided. Inhibiting dehydration helps maintain delicate structures without shrinkage. Moreover, volatile or even liquid samples are stabilized under the electron beam. Cryo fracturing techniques allow for study of the internal microstructure of these types of vulnerable materials as well.<h3>SMART – POWERFUL – FLEXIBLE</h3> <p>Cryo-SEM imaging is a powerful tool in studying the structures of electron beam and vacuum sensitive materials. These materials include: fragile biological structures such as fungi, plants, cells, etc. as well as soft or volatile samples and even liquids. Cryo-SEM offers some clear advantages by rapidly freezing a sample prior to imaging, thus maintaining the sample as close as possible to its natural state. Long dehydration and chemical fixation steps can be avoided. Inhibiting dehydration helps maintain delicate structures without shrinkage. Moreover, volatile or even liquid samples are stabilized under the electron beam. Cryo fracturing techniques allow for study of the internal microstructure of these types of vulnerable materials as well. A few of the disadvantages are that for efficient freezing, the sample size must be small and the price may not be in everyone’s budget for a state-of-the-art cryo system with freezing station, cold stage, vacuum transfer system etc.</p> <p class="caption" style="text-align:center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Poor%20Man's%20Cryo-SEM%201.jpg?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=oEkLBSoy8YUCLOFyw7uz5vvaIgg%3D" /><br /> <strong>Figure 1</strong>: Polymer screws isolate cryo-stub from holder</p> <p>A low cost alternative to a complete cryo-system that has been demonstrated to provide good results for many applications is a simple Cryo Block. The technique is a simple and cost effective means of looking at fully hydrated materials or other electron beam and vacuum sensitive samples. It involves pre-freezing a Cryo Block in liquid nitrogen and then contact freezing the sample prior to placing it in the SEM. The advantage of this technique is that it is simple, cost effective and the sample will in situ freeze dry in the SEM. The disadvantage is that there is no temperature control and the sample will in situ freeze dry inside the SEM.</p> <p>The supplies you’ll need are a thermos container or something suitable to put a small amount of liquid nitrogen in, a Cryo Block and cryo-glue or clamps to fix your sample to the stub.</p> <p>The sample preparation procedure is as follows:</p> <ol> <li>Immerse the Cryo-Stub in liquid nitrogen and let it equilibrate</li> <li>Once fully cooled, remove the Cryo-Stub and quickly contact freeze your sample and place inside the SEM</li> <li>Image as normal. It is helpful to insulate your cooled brass block from the basic holder –simple teflon screws or spacers would provide such insulation.</li> </ol> <p class="caption" style="text-align:center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Poor%20Man's%20Cryo-SEM%202.jpg?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=ywxfnmpfd2fS5GNe71Z8KwKgRJo%3D" /><br /> <strong>Figure 2</strong>: Orchid- Stigma anther</p> <p class="caption" style="text-align:center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Poor%20Man's%20Cryo-SEM%203.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=VOzIDRf435NWKhxQMmSOvdZez7w%3D" /><br /> <strong>Figure 3</strong>: Sour cream</p> EBSD Analysis of Materials Utilizing High Temperature Protochips Aduro System in FE-SEMhttps://www.jeolusa.com/RESOURCES/Electron-Optics/Documents-Downloads/ebsd-analysis-of-materials-utilizing-high-temperature-protochips-aduro-system-in-fe-semIT800Mon, 02 Nov 2020 12:51:01 GMTIn recent years with the advances in both EBSD and FE-SEM technology there have been renewed efforts at analyzing nanostructured materials at high temperatures using dedicated specimen holders and sub-stages. Although the techniques for EBSD analysis of bulk materials using heating stages have been well established [1], the requirements for nanostructured materials preparation and analysis obviously differs from bulk materials and can benefit from a miniaturized heater with smaller sample/higher temperature capacity capability [2].<p>Natasha Erdman<sup>1</sup>, Masateru Shibata<sup>1</sup>, Dan Gardiner<sup>2</sup> and Benjamin Jacobs<sup>2</sup></p> <p><sup>1</sup> JEOL USA Inc., 11 Dearborn Rd, Peabody MA USA<br /> <sup>2</sup> Protochips Inc., 616 Hutton St. Suite 103, Raleigh NC USA</p> <p>In recent years with the advances in both EBSD and FE-SEM technology there have been renewed efforts at analyzing nanostructured materials at high temperatures using dedicated specimen holders and sub-stages. Although the techniques for EBSD analysis of bulk materials using heating stages have been well established [1], the requirements for nanostructured materials preparation and analysis obviously differs from bulk materials and can benefit from a miniaturized heater with smaller sample/higher temperature capacity capability [2].</p> <p>We have performed initial testing of a Protochips Aduro heating and electrical biasing system using a JEOL JSM-7100FT/LV FE-SEM microscope. The holder was redesigned from the original holder configuration to allow smooth transition from flat specimen experiments to 70 deg tilt required for EBSD acquisition, with no geometrical restrictions in terms of standard EBSD working distance selection or EBSD camera insertion. The holder can be inserted seamlessly through the load-lock loading mechanism, while the existing microscope stage has an adapter that connects to electrical feedthroughs that can apply a bias for heating or electrical experiments. The small heating element on the Aduro system enables fast thermal ramp rates and high thermal stability, so the specimen size is limited to approximately 50 μm and smaller, sufficient for powders and other nano-material host specimens.</p> <p>Our initial set of experiments was performed using an electrical contact, where a thin film of Au (400Å) was deposited on to of existing Ti layer (100Å). The initial Au film structure showed nano-grained material with grain size on the order of 20-100 nm (Fig. 1a). The specimen was tilted to 70deg; a small electrical current was passed through the specimen (14.5 mA) until the sufficient amount of current induced a break in the film and a significant change in Au grain structure (Fig. 1b). Fig. 2 shows the EBSD map of the break area taken at 20kV. This set of data demonstrated the potential of this holder to induce structure transformation which can be characterized via EBSD analysis.</p> <p>In this paper we will present additional examples of materials analyzed via FE-SEM and EBSD, for example Cu/Ag alloy powder, which has demonstrated dramatic transformation under increased temperature conditions (Fig. 3). Our data shows that the Protochips Aduro heating and electrical biasing system with its fine control of the temperature, the ability to reach temperatures as high as 1200 ºC and electrical biasing capability, has proven to be a viable alternative to traditional bulk holders for the analysis of nanostructured materials using EBSD.</p> <p>[1] GGE Seward, S Celotto, DJ Prior, J Wheeler, RC Pond, In situ SEM-EBSD observations of the hcp to bcc phase transformation in commercially pure titanium, Acta Materialia, 52, 821-832 (2004)<br /> [2] LF Allard, M Flytzani-Stephanopoulos, SH Overbury, Behavior of Au Species in Au/Fe2O3 Catalysts Characterized by Novel In Situ Heating Techniques and Aberration-Corrected STEM Imaging, Microscopy and Microanalysis, 16, 375-385 (2010)</p> <p class="caption" style="text-align:center;"><strong><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/EBSD%20Analysis%20of%20Materials%201.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=6PD2bNOwkXMozE5HvEA6308d62Q%3D" /><br /> Figure 1</strong>. Au (400A) film on Ti – electrical contact. (a, left) before and (b, right) after electrically induced break (image rotated 90 deg from the original orientation).</p> <p class="caption" style="text-align:center;"><strong><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/EBSD%20Analysis%20of%20Materials%202-3-4.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=gwDLH4F8exPWIdEeAWx%2B1lbSbBQ%3D" /><br /> Figure 2</strong>. EBSD data collected after electrically induced break. Top - image quality map, bottom – IPF (ND) map. 15kV, 6nA.</p> <p class="caption" style="text-align:center;"><strong><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/EBSD%20Analysis%20of%20Materials%205.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=jdTHB8ZuTawiBKBDHhwG9VoReZA%3D" /><br /> Figure 3</strong>. Transformation of Cu/Ag powder under temperature (increasing from left to right 500->650->800->1200C). Note grain coalescence and growth as a result of elevated temperature and eventual result of a ‘molten’ ball of the alloy. Upon quenching, the ball develops faceting.</p> Electron Backscatter Diffraction (EBSD)https://www.jeolusa.com/RESOURCES/Electron-Optics/Documents-Downloads/electron-backscatter-diffraction-ebsdIT800Wed, 04 Nov 2020 16:44:35 GMTElectron Backscatter Diffraction (EBSD) is a powerful technique capable of characterizing extremely fine grained microstructures in a Scanning Electron Microscope (SEM). Electron Backscatter Patterns (EBSPs) are generated near the sample surface, typically from a depth in the range 10 – 50nm. In order to achieve effective analysis it is imperative to combine high beam current with small probe size to achieve high spatial resolution in a time efficient manner.<h4>Latest Innovation in our FE SEMs</h4> <h3>SMART – POWERFUL – FLEXIBLE</h3> <p>Electron Backscatter Diffraction (EBSD) is a powerful technique capable of characterizing extremely fine grained microstructures in a Scanning Electron Microscope (SEM). Electron Backscatter Patterns (EBSPs) are generated near the sample surface, typically from a depth in the range 10 – 50nm. In order to achieve effective analysis it is imperative to combine high beam current with small probe size to achieve high spatial resolution in a time efficient manner. The general setup for EBSD is shown in Fig. 1.</p> <p class="caption" style="text-align:center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Electron%20Backscatter%20Diffraction%20(EBSD)%201.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=f8iYbAqCgX%2BgkKmHEtwFNxWc9KY%3D" /><br /> <strong>Figure 1</strong>. General setup for EBSD in FE-SEM</p> <p>JEOL’s <a href="/PRODUCTS/Scanning-Electron-Microscopes-SEM/FE-SEM/JSM-IT800">IT800SHL</a> is a newly developed extreme high resolution system that features all the previous benefits of a JEOL FE-SEM, including aperture angle control lens (maintains minimum spot size even at very high beam currents) and specimen bias function for improved resolution at low kV. The system has also brand new design components that provide extreme resolution at all kVs – the super hybrid lens (combination electrostatic and electromagnetic) as well as new suite of in-column detectors that allow signal filtering. These features contribute to the ability to perform both imaging and analytical work at very high spatial resolution. Fig. 2 shows an example of Pt film with grain size of ~ 20-100 nm analyzed by EBSD.</p> <p class="caption" style="text-align:center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Electron%20Backscatter%20Diffraction%20(EBSD)%202.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=6EuxBgRFN9FtU2UHEPIrhxmqbr0%3D" /><br /> <strong>Figure 2</strong>. EBSD map (IPF) of Pt film, collected with Oxford HKL system.</p> <p>The super hybrid lens design allows observation of any type of sample (even highly magnetic specimens) without any pattern distortion. Fig. 3 shows a sample of neodymium sintered magnet (Nd2Fe14B) IPF map.</p> <p class="caption" style="text-align:center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Electron%20Backscatter%20Diffraction%20(EBSD)%203.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=vGzyirWJXJoJOh3DfniaeGsxCtQ%3D" /><br /> <strong>Figure 3</strong>. EBSD map (IPF) of Nd sintered magnet, collected with EDAX TSL system.</p> <p>Another feature of IT800SHL is the ability to perform EBSD analysis using an LDF mode (long depth of field). This mode allows collection of EBSD maps of a large specimen area in unattended fashion. An example of such analysis is shown in Fig. 4 – a large area of a solar cell device (polycrystalline silicon) was analyzed in 15 min (100 microns step, 75 points/sec) by acquiring maps from 3 adjacent analysis areas and stitching them together. If the stage movement was employed in this case to cover a wide specimen area, the same analysis would take over 10 hrs.</p> <p class="caption" style="text-align:center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Electron%20Backscatter%20Diffraction%20(EBSD)%204.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=gDlbe4dBcP4uVE7%2BHaSsWrbtnyw%3D" /><br /> <strong>Figure 4</strong>. Wide area EBSD – montage of 3 adjacent areas stitched together. Sample – solar device (poly-Si).</p> Electron Flight Simulator (EFS)https://www.jeolusa.com/RESOURCES/Electron-Optics/Documents-Downloads/electron-flight-simulator-efsIT200Wed, 04 Nov 2020 12:14:24 GMTUtilizing Monte Carlo Modeling of electron trajectories Electron Flight Simulator is a software tool designed to make your job easier. It can help you understand difficult samples, show the best way to run an analysis, and help explain results to others. With it you can see how the electron beam penetrates your sample, and where the X-ray signal comes from, for a wide variety of microscope conditions. You can model multiple layers, particles, defects, inclusions, and cross-sections. Any sample chemistry can be modeled.<p>Utilizing Monte Carlo Modeling of electron trajectories Electron Flight Simulator is a software tool designed to make your job easier. It can help you understand difficult samples, show the best way to run an analysis, and help explain results to others.</p> <p>With it you can see how the electron beam penetrates your sample, and where the X-ray signal comes from, for a wide variety of microscope conditions. You can model multiple layers, particles, defects, inclusions, and cross-sections. Any sample chemistry can be modeled.</p> <p class="caption" style="text-align:center;"><img alt="" src="https://jeolusa.s3.amazonaws.com/resources_eo/Electron%20Flight%20Simulator%20PN-EFS%201.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=dvrgnxKOoKHFtSNkQF2oQeIcTOE%3D" /><br /> Bulk samples to particles on multi-layer samples or inclusions in bulk samples.</p> <p class="caption" style="text-align:center;"><img alt="" src="https://jeolusa.s3.amazonaws.com/resources_eo/Electron%20Flight%20Simulator%20PN-EFS%202.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=Gh40DjckczbMdJEO6%2FfYMnKKk2U%3D" /><br /> Multi-layer samples normal to the beam or perpendicular in cross-section (or any angle in between).</p> <p class="caption" style="text-align:center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Electron%20Flight%20Simulator%20PN-EFS%203.jpg?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=t9RYFbNMGgJurU2qsAWEgK9091s%3D" /><br /> Electron beam scatter in low-vacuum.</p> <p class="caption" style="text-align:center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/Electron%20Flight%20Simulator%20PN-EFS%204.jpg?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=WJaMIUgsW8lgQfoUppCY5DpuIdw%3D" /><br /> The histogram shows beam intensity vs. lateral position. The green center indicates the radius of 80% of the beam.</p> <p>Simulation of:</p> <ul> <li>Electron trajectory in bulk or multi-layer sample</li> <li>Electron trajectory of particle or inclusion</li> <li>X-ray generation point indication</li> <li>PhiRhoZ curve</li> <li>EDS simulated spectrum</li> <li>Electron trajectory under low vacuum</li> </ul> <p>System Requirements:</p> <ul> <li>Computer: MS Windows 7 Based Computer</li> <li>MS Visual Basic 6 run time package</li> </ul> <p><strong>EFS part number: 803091761</strong></p> JEOL SEM and Remote Viewing-Controlhttps://www.jeolusa.com/RESOURCES/Electron-Optics/Documents-Downloads/jeol-sem-and-remote-viewing-controlIT200Wed, 04 Nov 2020 12:33:08 GMTJEOL SEMs are delivered with the capability for remote viewing and remote operation. The SEM computer includes a 2nd ethernet card for connection to your local area network. There is no need for a second support computer. Just connect your JEOL SEM computer to a reliable and fast broadband internet connection and choose the software platform that meets your remote access requirements.<p><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/JEOL%20SEM%20Remote%20Viewing-Control%201.png?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=Q6xV%2BhODW1h%2FtLAd4LCRCl07HJs%3D" style="margin: 6px 12px; float: right;" />Remote work has grown rapidly over the past decade. Changing social and business trends, advances in technology and necessity have facilitated this growth and this growth is expected to continue. Participation within the scientific community is especially strong and can be seen in a variety of ways such as: educational outreach programs, training, collaboration with teams at different locations, communicating with outside customers and even virtual scientific conferences.</p> <p>JEOL SEMs are delivered with the capability for remote viewing and remote operation. The SEM computer includes a 2nd ethernet card for connection to your local area network. There is no need for a second support computer. Just connect your JEOL SEM computer to a reliable and fast broadband internet connection and choose the software platform that meets your remote access requirements.</p> <p style="text-align: center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/JEOL%20SEM%20Remote%20Viewing-Control%202.jpg?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=2NDBu1KsJekSTlgTXh8zxQ7x8wQ%3D" /></p> <p>There are a host of software applications to choose from. Some are free and others will have either a one-time fee or are subscription based. Many remote desktop applications, screen sharing applications or video conferencing applications are compatible. When choosing which platform is right for you, consider whether you want to control the SEM remotely or just share the screen. Also consider how many simultaneous remote connections you may need at one time. There are simple peer-to-peer options or the ability to host a webinar type session with many attendees.</p> <p>Some examples of software applications for remote access, viewing or control include:</p> <p style="text-align: center;"><img alt="" class="img-responsive" src="https://jeolusa.s3.amazonaws.com/resources_eo/JEOL%20SEM%20Remote%20Viewing-Control%203.jpg?AWSAccessKeyId=AKIAQJOI4KIAZPDULHNL&Expires=2145934800&Signature=RInLs2ds3nSHmCWzXFr6QN%2Bax9k%3D" /></p> <p>Whether bringing SEM into your virtual class room or collaborating with teams across the globe, remote viewing and control of your JEOL SEM is ready.</p>