JEOL USA Press ReleasesJEOL USA Press Releaseshttps://www.jeolusa.com/NEWS-EVENTS/Press-ReleasesJEOL Introduces New Scanning Electron Microscope with “Simple SEM” Automation and Live Elemental and 3D Analysishttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/402/jeol-introduces-new-scanning-electron-microscope-with-simple-sem-automation-and-live-elemental-and-3d-analysisMicroscopy,SEMWed, 05 Jan 2022 17:23:13 GMT<h3>A new Scanning Electron Microscope (SEM) from JEOL answers the need for faster and easier acquisition of both SEM images and EDS data analysis, especially suited for repetitive operations and quality control.</h3> <p>JEOL, the global leader in the development of cutting-edge Electron Microscopes for materials characterization and analysis, introduces its latest SEM, the JSM-IT510. This new Scanning Electron Microscope features productivity enhancing automation, including “<strong>Simple SEM</strong>” automated imaging, automated montaging (both image and EDS map) and live EDS analysis (spectrum and map).</p> <p>The IT510 is the successor to the popular JEOL IT500 InTouchScope SEM, with its large sample chamber and tungsten or LaB6 filament. The IT510 features JEOL Intelligent Technology that enables seamless navigation from optical to SEM imaging, Live EDS and 3D analysis, and auto functions from alignment to focus for fast, clear, and sharp images.</p> <h5>The user of the new IT510 has several productivity-enhancing new features:</h5> <p>The new <strong>Simple SEM</strong> function automates image collection at multiple locations on a sample, and sets the various conditions required, including magnification and settings. <strong>Simple SEM</strong> simplifies and automates workflow for routine tasks.</p> <p>A new “<strong>Live 3D</strong>” function constructs 3D images of the sample surface during observation showing surface shape and depth information in real time.</p> <p>A <strong>Signal Depth automated function</strong> calculates the <strong>X-ray generation depth</strong> to support understanding of the analytical spatial resolution within a specimen under the conditions set. Useful when conducting elemental analysis.</p> <p>A new <strong>Low-vacuum Hybrid Secondary Electron Detector</strong> collects both electron and photon signals, providing an image with high S/N and enhanced topographic information. This detector also supports photon imaging with specimens that give a cathodoluminescence response.</p> <p><strong>Live Mapping</strong> displays the elemental map simultaneously with SEM imaging, made possible by a new <strong>Integrated SEM and Energy Dispersive X-ray Spectrometer (EDS) System</strong>. The user can switch seamlessly between the live map view and spectrum view during SEM image observation. Then they can overlay the element maps of interest on the live SEM image for enhancing understanding of element distribution within a specimen.</p> <p><strong>Zeromag</strong> software seamlessly navigates to the area of interest from an optical image of a larger general area of the sample. The user is never lost and can easily navigate to the desired observation area by simply clicking on the optical image.</p> <p>The JEOL IT510 is designed for unprecedented ease-of-use with advanced SEM technology in a compact platform. This smart-flexible-powerful Scanning Electron Microscope delivers the highest level of intelligent technology with built-in automation for the most versatile analytical SEM available today.</p> <p><a href="https://www.jeolusa.com/PRODUCTS/Scanning-Electron-Microscopes-SEM/HV-LV-Tungsten-LaB6-SEMs/JSM-IT510">For more information visit the product web page</a>.</p> 402Covalent Metrology and JEOL Announce Partnership, Silicon Valley Demonstration Facilityhttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/401/covalent-metrology-and-jeol-announce-partnership-silicon-valley-demonstration-facilityGeneral,Mass SpecMicroscopy,NMR,SEM,TEMWed, 08 Dec 2021 21:13:47 GMT<h4>The two leaders announced a partnership that includes a new JEOL demonstration facility located in Covalent’s Silicon Valley lab. The partnership will accelerate applications development and broaden client access to a suite of state-of-art instrumentation and analytical services.</h4> <p><strong>December 07, 2021 – </strong>Sunnyvale, CA. Covalent Metrology, a leading North American provider of analytical services, announces its partnership with JEOL a global leader in the development of cutting-edge scientific instruments used in microscopy, analytical chemistry, and materials characterization. JEOL’s state-of-art metrology instruments spanning these disciplines are coming soon to the announced JEOL USA demonstration facility, located within Covalent’s Silicon Valley lab.</p> <p>Covalent works with scientists and engineers from more than thirty industries, including semiconductor, battery and energy storage, electronics, and medical devices. The new demonstration facility will receive JEOL’s top-of-line electron microscopes and spectrometers over the coming months and will soon benefit clients across these sectors.</p> <p>The partnership deepens JEOL’s presence in Silicon Valley and will expand Covalent’s capacity and capabilities offered. The demonstration facility will serve as a platform to research and highlight technologies and methods tailored for advanced material and device analysis. JEOL will work closely with Covalent’s team of experts to deepen understanding of the market’s analytical needs - informing JEOL’s development of next generation hardware, software, and applications research.</p> <p>The Covalent and JEOL USA partnership delivers on their commitment to providing market access to advanced learning opportunities, and access to expertise and firsthand experience with cutting-edge instrumentation.  The partners will host a variety of demonstrations and educational events at the lab’s demonstration facility. JEOL’s commitment to providing Covalent experts access to the company’s newest instruments, ensures Covalent customers benefit from the most advanced instrumentation available.</p> <p>Craig Hunter, Covalent Founder and CEO, commented, “JEOL has been a pioneer and leader in analytical instrumentation for 70 years. Their products are enabling some of the most exciting science and engineering happening around the world right now – work that is revolutionizing so many aspects of our modern society. We are honored that JEOL has chosen to partner in such a meaningful way with Covalent, and we are thrilled to house their Silicon Valley and West Coast demonstration lab here in Sunnyvale.”</p> <p>Robert Pohorenec, President of JEOL USA, stated, “Covalent Metrology provides world-class expertise to a very diverse set of industries in order to solve very complex problems. They and their clients require state-of-the-art metrology and analytical instrumentation. Partnering with Covalent Metrology is an exciting opportunity for JEOL to expand awareness of JEOL’s technology in the industries served by Covalent and it will provide us deeper insight into the needs of researchers and industries that both our organizations desire to serve.”</p> <p> </p> <p>For Media inquiries regarding Covalent Metrology please contact:  <br /> Shannon Scheiwiller, Chief Marketing Officer, <a href="mailto:shannon@covalentmetrology.com">shannon@covalentmetrology.com</a></p> <p><strong>About Covalent Metrology</strong><br /> Covalent Metrology is a disruptive analytical services laboratory and platform based in Sunnyvale, California. Its mission is to help companies who use advanced materials to get better data and insights more easily and affordably to facilitate faster development and production. Covalent is dramatically changing the characterization and imaging landscape by combining transparent pricing, data platforms, and top-notch customer service with world-class scientists, state-of-art tools, and strategic partnerships.<br /> Covalent now has over 500 customers in 30+ industries.<br /> Learn more at: <a href="https://covalentmetrology.com">https://covalentmetrology.com</a></p> 40124 Hours of Life Science Conferencehttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/388/24-hours-of-life-science-conferenceGeneral,Microscopy,NMR,SEM,TEMTue, 25 May 2021 14:00:48 GMT<p>On June 2, 2021, JEOL will focus on advances in life science research using electron microscopy in its “24 Hours of Life Science” conference. Twenty-four different sessions throughout the full day will cover topics including:</p> <p style="margin-left: 40px;">- Connectomics and the study of complete volumes of tissues or materials captured at high resolution<br /> - Correlative microscopy using light microscopy and scanning electron microscopy to collect large areas of TEM-like data at multiple depths, overcoming the challenge of small sample size and hindered fields of view<br /> - Direct Electron DE64 as a platform for automated cryo-electron microscopy<br /> - Exploring TEM phenomena from milliseconds to femtoseconds<br /> - Sub-2Å structures with CryoEM: from holes to hydrogens<br /> - Elucidating novel crystalline structures with Electron and NMR crystallography<br /> - NMR in the pharmaceutical industry</p> <p>Noted researchers in their field of expertise are scheduled to present and discuss their topics throughout the day, with interactive sessions. Attendees will be able to participate in any of the sessions that they choose.</p> <p>The event is hosted by JEOL’s headquarters in Germany, and facilitated with the participation of JEOL USA. To share in the most current ideas and solutions using electron microscopy in the life sciences, researchers worldwide are invited to participate in JEOL Germany’s MICROCOM II event, featuring a community of scientists from Europe and the United States on the frontline of research. <a href="https://bit.ly/2QzDcf0" target="_blank">Register at this link</a> for access to the live event on the MICROCOM II platform.</p> 388JEOL USA Welcomes New Managing Director, Hidetaka Sawadahttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/386/jeol-usa-welcomes-new-managing-director-hidetaka-sawadaGeneral,MicroscopyWed, 21 Apr 2021 16:37:30 GMT<p><strong>April 19, 2021 Peabody, Mass. --</strong> JEOL USA welcomes a new Managing Director, Dr. Hidetaka Sawada, to its Peabody, Massachusetts office this April. Dr. Sawada is a world-renowned expert in aberration corrected electron microscopy. Most recently he served as General Manager of the Technical and Development group in the Electron Microscopy Business Unit of JEOL, Ltd. in Akishima, Japan.</p> <p>Dr. Sawada’s expertise includes the development and installation of the aberration-corrected (Cs) Transmission Electron Microscopes for Oxford University, Lehigh University, and Oak Ridge National Lab, and the GRAND ARM at University of California at Irvine. Dr. Sawada obtained his PhD from the University of Tokyo.</p> <p>He supported TEM development at Oxford University with Professor Angus Kirkland and with JEOL customers throughout Europe as a member of the JEOL UK office. Kirkland and Sawada have published several papers together on instrument developments and their use in a range of materials characterization problems.</p> <p>“It has been a great pleasure to work with him on a number of projects, starting with the Oxford-JEOL project in Oxford through the GRAND ARM at the National Centre in Harwell where he spent two years, and most recently on the development of instruments for the Rosalind Franklin Institute.  Dr. Sawada is both a valued colleague and a friend, and I wish him every success in his new role at JEOL USA,” Prof. Kirkland said.</p> <p>Dr. Sawada succeeds Katsu Yaguchi, who held several key positions in information technology, business planning and finance since joining JEOL.  JEOL USA President Robert Pohorenec said, “The influence of Katsu Yaguchi has been extremely valuable to us and will continue to influence JEOL USA in future. We welcome Hide Sawada to our JEOL USA office and know that he will be a great resource for our microscopy community.”</p> 386JEOL Announces 2020 Microscopy Image Grand Prize Winnershttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/375/jeol-announces-2020-microscopy-image-grand-prize-winnersGeneralMicroscopy,SEM,TEMThu, 07 Jan 2021 17:35:01 GMT<p><strong>January 7, 2021, Peabody, Mass.</strong> - JEOL USA awarded two Grand Prizes to winners of its 2020 Electron Microscopy Image Contest, and kicked off its 2021 Image Contest at the beginning of the new year. The annual contest showcases JEOL microscope users’ artistically or esthetically pleasing images with good composition, sharp focus, and technical competency, especially in the use of accelerating voltage.</p> <p style="text-align: center;"><img alt="" src="/Portals/2/Press/the-screamer-2020.jpg?ver=KWwOuIpqGcZwR-D_EX-91A%3d%3d" style="width: 800px; height: 542px;" /></p> <p>The Grand Prize Transmission Electron Microscope (TEM) Image award was given to Lita Duraine, a certified electron microscopist at Baylor College of Medicine in Baylor, Texas. “The Screamer 2020” resembles a screaming cartoon character (possibly a good depiction of how many felt about 2020), but is actually a detailed, high magnification image showing firing between boutons in a Drosophila melanogaster (fruit fly) sample. It was imaged on the JEOL JEM-1400Plus TEM as part of a bouton study on muscle weakness. Lita explains that “Manipulating Drosophila melanogaster is a bit challenging from an electron microscopy point of view, but is so indispensable for genomic research in Amyotrophic lateral sclerosis (ALS), Alzheimer’s, and other debilitating diseases.” The common fruit fly serves as a model organism for studying genetics and other fields of research.</p> <p style="text-align: center;"><img alt="" src="/Portals/2/Press/Estigma%20com%20gr%C3%A3os%20de%20p%C3%B3len%20Flavio%20Guerra%20Brazil%2070x.jpg?ver=KWwOuIpqGcZwR-D_EX-91A%3d%3d" style="width: 800px; height: 600px;" /></p> <p>The Grand Prize Scanning Electron Microscope (SEM) Image award was given to Flávio Loureiro, an engineer working in the laboratories of a Vallourec Group’s plant located in Brazil. His image “Seeds in the Cradle” is both artistic and detailed, showing Pollen grains over the stigma of an aster flower (Symphyotrichum Tradescantii). Vallourec is a steel mill that produces seamless pipes, and the company uses the JSM-6360 SEM for quality control and imaging of metallic materials. Loureiro says, “In the case of this particular image, my purpose was really just because of my curiosity, and because I really love to work with SEM images! I would give a brief lecture on SEM for some colleagues; I wanted to obtain an image that could reflect the capabilities of the instrument, revealing how beautiful and surprising can be the nature in its details, just nearby us. So, I caught this very simple flower that was in the lab’s garden, and started to analyze it on the SEM! In fact, I could say that the main drive for this image was just curiosity and beauty.”</p> <p>Both image contest winners have participated and won previously in JEOL’s annual contest. The JEOL Image Contest began in 2014 and all entries and winning images are available for viewing at <a href="https://www.jeolusa.com/NEWS-EVENTS/JEOL-USA-Image-Contest-Entries-Winners">https://www.jeolusa.com/NEWS-EVENTS/JEOL-USA-Image-Contest-Entries-Winners</a>.</p> 375JEOL Announces New High Throughput Analytical Transmission Electron Microscopehttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/333/-jeol-announces-new-high-throughput-analytical-transmission-electron-microscopeGeneral,Microscopy,TEMThu, 03 Jan 2019 15:18:59 GMT<p>JEOL Ltd. (President Gon-emon Kurihara) announces the release of a new <a href="https://www.jeol.co.jp/en/news/detail/20181211.3066.html" target="_blank">high throughput analytical electron microscope, JEM-ACE200F</a>, to be released in December 2018.</p> 333JEOL Introduces World's Fastest Direct Write E-Beam Toolhttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/167/JEOL-Introduces-Worlds-Fastest-Direct-Write-E-Beam-ToolMicroscopyTue, 16 May 2017 16:24:00 GMT<p><em><strong><img alt="" src="/Portals/2/Press/JEOL%20JBX-8100FS.jpg" style="margin: 4px 7px; float: right; width: 400px; height: 367px;" title="" />May 16, 2017 (Peabody, Mass.) --</strong></em> Since 1967, JEOL has been the industry leader in Electron Beam Lithography design and manufacturing. Now the company enters its 51st year in this field with the introduction of a new high throughput spot beam direct write system, the JBX-8100FS.</p> <p>This new generation of e-beam introduces the capability of writing ultrafine patterns at a high rate of speed directly onto substrates with minimum idle time during the exposure process. Maximum scanning speed has been increased to 125 MHz (the world’s highest level) for high speed writing applications.</p> <p>The JBX-8100FS features two exposure modes to support a range of patterning options, from ultra fine processing to faster throughput for small-to-mid-size production. The tool allows rapid development of integrated circuit patterns for prototypes or high volume manufacturing.</p> <p>Direct write electron beam lithography can be used to quickly write integrated circuit patterns with feature sizes guaranteed less than 10 nm onto a variety of substrate materials, and for superior pattern stitching of +/- 9nm or less in high throughput mode, or +/-20nm or less in high throughput mode. The high-precision stage accommodates substrates ranging from 200 mm diameter wafers down to small pieces.  </p> <p>The new system's small, compact footprint and low power consumption reduce cost of ownership. All JEOL e-beam systems are supported by the company's dedicated service engineers.</p> <h4>Birck Nanotechnology Center, Purdue University, to be first US installation</h4> <p>JEOL USA will install the first JBX-8100FS in North America at the Birck Nanotechnology Center, Purdue University, under the direction of Ali Shakouri and Dimitrios Peroulis. The interdisciplinary research center provides infrastructure for 160 affiliated faculty members and their research groups. The 186,000 sq ft. facility includes a 25,000 sq. ft. ISO Class 3-4-5 (Class 1-10-100) nanofabrication cleanroom.</p> <p><a href="http://www.jeolusa.com/PRODUCTS/Photomask-Direct-Write-Lithography/Electron-Beam-Lithography/JBX-8100FS">Learn more about the new JBX-8100FS</a>.</p> 167NEW Versatile High Throughput SEM from JEOLhttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/148/NEW-Versatile-High-Throughput-SEM-from-JEOLMicroscopy,SEMWed, 04 Nov 2015 15:45:00 GMT<p><strong><img align="right" alt="" src="/Portals/2/Press/JSM-IT100.jpg" />Portland, OR - November 4, 2015</strong> -- JEOL's new <a href="/PRODUCTS/ScanningElectronMicroscopes(SEM)/HVLVTungstenLaB6SEMs/JSM-IT100InTouchScope™/tabid/1392/Default.aspx">JSM-IT100</a> is the latest addition to its InTouchScope Series of Scanning Electron Microscopes. Representing 50 years of industry leadership with advances in SEM, the IT100 is a simple-to-use versatile, research-grade SEM with a compact ergonomic design.</p> <p>Featuring expanded EDS analysis capabilities and ports for multiple detectors, the InTouchScope is a versatile workhorse SEM that can be configured to meet individual lab requirements at an exceptional value. It offers high resolution imaging and a range of acceleration voltages at both high and low vacuum modes.</p> <p>The IT100 is a remarkably intuitive, high throughput microscope designed to streamline workflow in any lab. Touchscreen operation, or traditional keyboard and mouse interface are at the operator's fingertips. Fast data acquisition make imaging and analysis of samples a simple task.</p> <p>With the IT100, it is simple to quickly obtain high quality images using both Secondary Electron and Backscatter Imaging. The embedded JEOL EDS system with silicon drift detector technology now includes Spectral Mapping, Multi-Point Analysis, Automatic Drift Compensation, Partial area, Line Scan, and Mapping Filter functions.</p> <p>JEOL's popular InTouchScope series includes the NeoScope benchtop SEM with selectable HV/LV and the JSM-IT300LV with advanced analytical capabilities and imaging of large, intact samples.</p> <p>The IT100 is being demonstrated for the first time in the U.S. today at ISTFA in Portland, OR.</p> 148JEOL Brasil Sponsors LNNano Transmission Electron Microscopy Summer Schoolhttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/145/JEOL-Brasil-Sponsors-LNNano-Transmission-Electron-Microscopy-Summer-SchoolMicroscopy,TEMThu, 20 Aug 2015 19:48:00 GMT<p><strong>August 20, 2015 (Peabody, MA and Sao Paulo, Brazil)</strong> --- JEOL BRASIL Instrumentos Científicos Ltda. is proud to sponsor the 6th biannual Transmission Electron Microscopy (TEM) Summer School being held at the Brazilian Nanotechnology National Laboratory (LNNano), located in the Brazilian Center for Research in Energy and Materials (CNPEM) campus, Campinas - Brazil. The classroom sessions will be scheduled between January 11 and 29, 2016. Candidates may apply until August 31st. 100 participants are expected to attend.</p> <p style="text-align: center;"><img alt="" src="/Portals/2/Press/LNNano%20Summer%20School%2028-V-Curso-TEM-Foto-Guilherme-Borini.jpg" /></p> <p>Three high-resolution, versatile TEM models from JEOL will be used for training: JEM-1400, JEM-2100, and JEM-2100F. Applications experts from JEOL will also be available for assistance. "We are delighted to support LNNano and be involved with this highly-regarded, national educational program," says Mr. Yuichi Matsumoto, President of JEOL Brasil Ltda., located in Sao Paulo, Brazil.</p> <p>JEOL is a world leader in the development and manufacture of high performance, high stability Transmission Electron Microscopes (TEM) with more than 60 years of expertise in producing TEMs designed for life sciences and material sciences. Some of the world’s most notable researchers use JEOL TEMs in their work.</p> <p>Details for applicants are provided by LNNano:</p> <h3>LNNano receives applications for the 6th TEM Summer School</h3> <p>The TEM Summer School aims to contribute to the advanced training of graduate students and researchers in the fields of engineering, materials science, physics, chemistry and related fields from academic and industrial communities, in Brazil and abroad, on theoretical and practical concepts of TEM techniques for materials characterization. It is a three week course where the first two weeks are dedicated to basic and advanced theoretical classes and the third one will be focused on practical classes using the Electron Microscopy facilities available at LNNano.</p> <p>The courses will be taught by leading researchers in the field of electron microscopy associated to important research and educational institutions of Brazil and oversees. See all speakers for the 6th edition.</p> <p><em>Official invitation from the Organizing Committee</em></p> <p>Every candidate must fill out the application form, attaching an updated CV, Graduate transcripts, a summary of research project justifying the use of TEM techniques, an essay justifying why is important for you to attend the school, an abstract of partial or complete analysis of your own scientific research (using TEM) to present as poster, and a recommendation letter. Check How to participate.</p> <p>The 6th TEM Summer School is organized by the Electron Microscopy Laboratory (LME/LNNano) with the FAPESP support. For further information please visit: <a href="http://pages.cnpem.br/temsummerschool">http://pages.cnpem.br/temsummerschool</a></p> 145New JEOL E-Beam Lithography System to Enhance Quantum NanoFab Capabilitieshttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/143/New-JEOL-E-Beam-Lithography-System-to-Enhance-Quantum-NanoFab-CapabilitiesMicroscopyThu, 07 May 2015 00:50:00 GMT<p><strong>May 5, 2015 - Peabody, MA</strong> -- A state-of-the-art JEOL e-beam lithography system will soon be a new resource for quantum information science researchers that utilize the cutting-edge facilities at the University of Waterloo Quantum NanoFab in Waterloo, Ontario. The JEOL JBX-6300FS e-beam system will be used to write circuitry patterns at very high resolution and linewidths as small as 8nm. With accelerating voltage capability to 100kV, high resolution patterns can be written on substrates coated in thick resist.</p> <div class="thumbnail"><img alt="" src="/Portals/2/Press/UWaterloo-Quantum-Nano-Centre.jpg" /> <div class="caption small">University of Waterloo Quantum Nanofab</div> </div> <p>"We're very excited to obtain this 100kV system." said Vito Logiudice, Director of Operations for the Quantum NanoFab. "This opens the lab up for certain types of research where people need to use thick resist all while pushing the limits on minimum feature size." The new system will be an integral part of the Quantum Nanofab's goal of providing the tools needed for next-generation quantum devices.</p> <p>The challenge of creating ever more powerful microchips, which continue to shrink in size, demands new technologies on the scale of individual atoms, or the quantum scale. Through the work being done in the Quantum Nanofab, which serves the Institute for Quantum Computing (IQC) and the Waterloo Institute for Nanotechnology (WIN), the University of Waterloo is poised to make that leap. Researchers will be able to "corral" single electrons through the lithography patterns they will write using the JEOL JBX-6300FS.</p> <p>"This new e-beam system is going to be extremely helpful in that regard. They will be able to further advance their work on gate defined quantum dots with metal gates < 20nm wide and metal-to-metal spacing of less than 40nm," Logiudice explains. The e-beam will also write both large and very fine features in the same layer on the substrate, using high resolution as well as coarse writing modes, which can be programmed into a batch process run overnight. “This will be of great benefit for the writing of superconducting Josephson junction qubits and the microwave circuits that are used to manipulate their states.” adds Nathan Nelson-Fitzpatrick, Nanofabrication Process Engineer on the Quantum NanoFab team.</p> <h4>JBX 6300FS Offers Flexible User Experience</h4> <div class="thumbnail pull-left" style="margin-right: 12px;"><img alt="" src="/Portals/2/Press/Washington-Nanofabrication-Facility.jpg" /> <div class="caption small">Washington Nanofabrication Facility</div> </div> <p>An attractive aspect of the JBX 6300FS is the wide spectrum of user experience the system can now accommodate. The University of Waterloo is teaming up with JEOL and Cornell University’s Nanofabrication Facility to showcase the system’s dual interfaces, both a traditional GUI/Graphical User Interface and a powerful Python-based scripting language. With scripting, power users can manipulate incoming data and perform exposures based on non-periodic arrays or logarithmic dose arrays, for example. However, that same scripting power allows the creation of new GUI’s based on the comfort or training level of the user.</p> <p>"The 6300FS hardware is as flexible as the software, a core strength that comes from being one of the founding EBL solutions providers in the industry that has continually provided the latest in technology for advances in research," said JEOL EBL product manager, Zane Marek. "Though the University of Waterloo continues to grow, their substrates might actually start to shrink. As research on exotic materials continues - and those substrate prices remain 'exotic' - JEOL has secured the ability to confidently load and expose them."</p> <p>Marek added, "We have the best customers in the world. They work with us and their peers at other facilities to discover novel ways to load and expose the smallest of these exotic materials. We really are in this together."</p> <h4>Technology Hub in Waterloo</h4> <div class="thumbnail pull-right" style="margin-left: 12px;"><img alt="" src="/Portals/2/Press/Quantum-NanoFab-Litho-Bay.jpg" /> <div class="caption small">University of Waterloo Quantum Nanofab</div> </div> <p>Known as the Quantum Valley, the Waterloo Region is home to the Institute for Quantum Computing (IQC) and the Waterloo Institute for Nanotechnology (WIN) at the University of Waterloo. The Quantum NanoFab serves both institutes in its location in the 280,000 sq. ft. Mike & Ophelia Lazaridis Quantum-Nano Centre. Since its opening in September 2014, the Quantum NanoFab has been host to some 90 new users under the direction of 25 different faculty members at the university. Plans are in place to allow more users from outside the university in the near future. </p> <p>The University of Waterloo boasts a unique Intellectual Property policy where IP is inventor owned. “This policy attracts entrepreneurs and researchers to the University of Waterloo,” says Loguidice. “Coupled with the largest co-op program in North America, Waterloo gives our students a definite edge for their future endeavors both in the private and public sectors."</p> <h4>JEOL EBL Expertise</h4> <p>JEOL has a long history of e-beam innovation and expertise, with more than 45 years of design, production, and support of the company's lithography tools, which include photomask writing and direct write systems. The JBX-6300FS can easily write patterns down to 8nm or less using an electron optics system that automatically adjusts a 2.1nm electron beam at 100kV accelerating voltage. It also achieves high field-stitching and overlay accuracy of 9nm or less, providing high cost performance. A unique automatic correction function developed by JEOL enables high-precision pattern writing. The JBX-6300FS can write highly precise patterns even at field corners and boundaries by the use of its powerful electron optical system that automatically corrects distortions generated by beam deflection.</p> <p>The company's serves the Americas with both sales and support through its main USA office in Peabody, Massachusetts, and with offices in Canada, Mexico, and Brasil.</p> 143New NMR Spectrometer Series Announced by JEOL Ltd.https://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/135/New-NMR-Spectrometer-Series-Announced-by-JEOL-LtdMicroscopy,NMRWed, 20 Aug 2014 19:41:00 GMT<p><img align="right" alt="" src="/Portals/2/Press/press_20140820_01.jpg" style="margin-bottom: 7px; margin-left: 12px;" />JEOL Ltd. (President Gon-emon Kurihara) and JEOL RESONANCE, Inc. (President Takahiro Anai) is pleased to announce a new line of NMR spectrometers, JNM-ECZS series. The JNM-ECZS series is a next generation NMR spectrometer that incorporates ultra-high accuracy RF circuitry utilizing the latest digital high frequency technology. The compact spectrometer design features unprecedented levels of performance and expandability to support the most advanced NMR experiments.</p> <h4>Features</h4> <p>The 43% reduction in size of the JNM-ECZS series compared to previous models simplifies NMR spectrometer placement in modern laboratories. Performance features critical to NMR data collection such as RF phase, frequency, and amplitude control, NMR pulse shape waveform data table size, and digital receiver performance have been improved by several orders of magnitude. These features collectively support the most advanced NMR experiments that combine a wide variety of NMR pulses in complicated NMR pulse sequences.</p> <p>A complete set of high performance NMR probes are available for the JNM-ECZS spectrometer to support many NMR applications, including a new high sensitivity liquid-nitrogen probe capable of variable temperature experiments from -40 to 150°C. Combined with the new auto sample changers and auto tuning unit announced last year, the JNM-ECZS spectrometer system is capable of fully automated continuous operation from sample measurement to data processing.</p> <p>JEOL will begin distribution of the JNM-ECZS in September 2014.</p> 135Take Your Best Shot! JEOL Launches SEM/TEM Image Contesthttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/133/Take-Your-Best-Shot-JEOL-Launches-SEMTEM-Image-ContestGeneral,Mass SpecMicroscopy,NMR,SEM,TEMSun, 09 Mar 2014 19:21:00 GMT<p><strong>March 6, Peabody, Mass.</strong> -- JEOL USA has launched an imaging contest to showcase some of the best work of users of its electron microscopes. A winning image will be selected for each month of 2014, judged by JEOL's SEM and TEM applications teams for their technical and artistic qualities.</p> <p>"Many customers have asked us about launching an image contest, so we decided to do just that starting this year. JEOL SEM and TEM users are the experts in their fields, and often at the forefront of discoveries. We have seen some outstanding images submitted so far, ranging from biological and botanical specimens, to new materials at the atomic level, 3D reconstructions for medical research, and geological and nanotechnology samples. They all represent technical expertise and artistic talent," said Vern Robertson, Technical Sales Manager at JEOL USA.</p> <p>All images submitted are part of an <a href="/HOME/Hidden/JEOLUSAImageContestEntriesWinners/tabid/1266/Default.aspx">online gallery</a> that JEOL has posted with a description of the sample and technique used.</p> <h3 style="clear: both;">January winner</h3> <p><img align="left" alt="" height="400" src="/Portals/2/Press/Nano-Bling-Rocky-Mt-Labs.jpg" style="margin-right: 12px; margin-bottom: 12px;" width="400" />The first image to win the contest was entitled "Nano Bling" and was submitted by Colin Davis of Rocky Mountain Laboratories in Golden, Colorado. The image, taken with an older model field emission Scanning Electron Microscope that was installed in the 1990s, was chosen for its contrasting textures and amorphous threads leading to an ordered sharply angular crystal.</p> <h3 style="clear: both;">February winner</h3> <p><img align="left" alt="" height="320" src="/Portals/2/Press/Xilinx.png" style="margin-right: 12px; margin-bottom: 12px;" width="400" />The second image, "Stars Reflected in an Astronaut's Helmet," was pseudo-colored and resembles a painting of an astronaut looking out into starry space. In reality the image is of a cross section of a microbump that reveals a void in the solder. It was submitted by Doug Hamilton of Xilinx in San Jose, California, and was also taken with a field emission SEM.</p> <p style="clear: both;">"While these images have great appeal visually, they are also technical appealing to scientists. We enjoy seeing the work and customers are having fun with this contest," said Robertson.</p> <p>Contest details can be found at <a href="/HOME/Hidden/JEOLUSAImageContest/tabid/1265/Default.aspx">www.jeolusa.com</a>.</p> 133New Extended Pressure SEM from JEOLhttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/130/New-Extended-Pressure-SEM-from-JEOLMicroscopy,SEMThu, 05 Sep 2013 15:07:00 GMT<p><strong><img align="right" alt="" height="290" src="/Portals/2/Press/IT300LV.jpg" width="300" />September 4, 2013 (Peabody, MA) </strong>-- JEOL introduces a new Scanning Electron Microscope with expanded pressure range, large specimen chamber, and unsurpassed resolution for imaging and characterizing a wide variety of sample types and sizes. The <a href="http://www.jeolusa.com/PRODUCTS/ElectronOptics/ScanningElectronMicroscopes(SEM)/HVLVTungstenLaB6SEMs/JSMIT300LV/tabid/1243/Default.aspx">JSM-IT300LV</a> is the latest addition to JEOL's popular series of tungsten low vacuum SEMs. This all-new design builds upon the award-winning platform of the company's InTouchScope™, analytical SEM with intuitive touch screen control, and the widely used high-performance analytical SEM, the JSM-6610LV. </p> <p>The new JSM-IT300LV extends vacuum pressure range to 10-650 Pa - more than twice that of earlier models. In low vacuum mode, this capability enhances SEM imaging versatility for samples that are wet, oily, outgas excessively or are non-conductive without pretreatment.</p> <p>A highly customizable SEM, the JSM-IT300LV features multiple ports for analytical attachments such as: energy dispersive X-ray spectrometer (EDS), electron backscatter diffraction (EBSD), cathodoluminescence detectors (CL), wavelength dispersive X-ray spectrometer (WDS), chamberscopes, heating/cooling substages etc.</p> <p>The large vacuum chamber accommodates samples up to 300mm in diameter and 80mm in height. When maintaining sample integrity is important, this feature makes it possible to image samples as large as a tennis shoe, automobile part, or full sized silicon wafer without alteration. A variety of sample holders are available for every type of sample including special requirements.</p> <p>JEOL SEMs are designed for the ultimate user experience and ease of use, and now the choice of multi-touch screen operation as well as keyboard/mouse and knob control will suit a wide variety of users. Sample navigation control, an embedded CCD camera, and 5-axis stage control with even faster asynchronous movement make it possible to image and analyze samples at a wide range of angles and orientations with pinpoint accuracy and location.</p> <p>Versatility and amazing clarity in imaging across the magnification range of 5X - 300,000X are the hallmarks of the JEOL tungsten SEM family, and the JSM-IT300LV brings that capability to its highest level of performance today. </p> 130JEOL Demonstrates New JEM-1400Plus 120kV Transmission Electron Microscope for High Contrast, CryoTEM, and S/TEM Applicationshttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/129/JEOL-Demonstrates-New-JEM-1400Plus-120kV-Transmission-Electron-Microscope-for-High-Contrast-CryoTEM-and-STEM-ApplicationsMicroscopy,TEMMon, 05 Aug 2013 20:29:00 GMT<p><strong><img align="right" alt="" height="395" src="/Portals/2/Press/1400Plus_Angle_Traced.jpg" style="margin-bottom: 4px; margin-left: 7px;" width="350" />August 5, 2013 (M&M 2013, Indianapolis, Indiana)</strong> -- JEOL USA will demonstrate its new JEM-1400Plus, a 120kV Transmission Electron Microscope, at Microscopy & Microanalysis (M&M) 2013 in Indianapolis, Indiana, from August 5-8.</p> <p>Based on the popular JEM-1400, the new TEM is making its debut in the United States at the annual meeting of the Microscopy Society of America. JEOL and Protochips have combined efforts to showcase the new TEM technology with the Aduro thermal sample holder in the Protochips booth # 504 at M&M 2013, adjacent to the JEOL booth #303.</p> <p>The new JEM-1400Plus TEM features high resolution/high contrast imaging, outstanding S/TEM analytical performance, elemental mapping with the latest large-area SDD detectors, cryomicroscopy, 3D tomography, and montaging.</p> <p>JEOL, a leading supplier of electron microscopes, has sold more than 2400 of its 100-120kV range TEMs worldwide. This versatile TEM is optimized for biological, polymer, and materials research. High contrast resolution is assured at 0.38nm point-to-point and 0.2nm lattice images.</p> 129New SpiralTOF™ MALDI TOF Applications Notebook Available from JEOLhttps://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/123/New-SpiralTOF-MALDI-TOF-Applications-Notebook-Available-from-JEOLMass Spec,MicroscopyFri, 27 Jul 2012 00:25:00 GMT<p><strong><a href="/RESOURCES/AnalyticalInstruments/DocumentsDownloads/tabid/337/Default.aspx?EntryId=896&Command=Core_Download"><img align="right" alt="" src="/Portals/2/brochures/SpiralTOF_Apps_Notebook-tn.jpg" style="border-width: 0px; border-style: solid; margin-bottom: 14px; margin-left: 20px;" /></a>July 26, 2012 (Peabody, Mass.)</strong> – A new Applications Notebook from JEOL features over 20 application notes describing the analysis of synthetic polymers, small organic molecules, complex drug mixtures, peptides, and proteins using the JEOL <a href="http://www.jeolusa.com/PRODUCTS/AnalyticalInstruments/MassSpectrometers/SpiralTOFMALDITOFTOF/tabid/747/Default.aspx">SpiralTOFTM MALDI TOF-TOF</a> mass spectrometer. The SpiralTOF time-of-flight optics design utilizes a figure-eight ion trajectory to allow a 17m flight path to fit in an extremely small console. This exceptionally long flight path results in an ultrahigh resolving power of >60,000 and sub-ppm mass accuracy. The optional TOF-TOF mode makes it the only MALDI TOF-TOF system capable of acquiring high-energy CID product-ion mass spectra for monoisotopically selected precursor ions.<br /> <br /> The <a href="/RESOURCES/AnalyticalInstruments/DocumentsDownloads/tabid/337/Default.aspx?EntryId=896&Command=Core_Download">JEOL SpiralTOF Applications Notebook can be downloaded</a> from the JEOL USA website or is available as a printed book upon request.</p> 123JEOL USA Exhibiting Imaging Solutions at APEX 2007https://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/41/JEOL-USA-Exhibiting-Imaging-Solutions-at-APEX-2007Microscopy,SEMTue, 16 Jan 2007 05:00:00 GMT<p><strong><img align="right" alt="" height="257" src="/Portals/2/Press/cs-polisher.jpg" width="250" />January 16, 2007, Peabody, MA</strong> -- For the first time in its 50+ year history, JEOL USA will be exhibiting at the IPC Printed Circuits Expo/APEX (February 18-22, 2007, Los Angeles, CA). JEOL USA will showcase an argon ion beam cross section polisher (CP) for specimen preparation prior to high magnification imaging with the scanning electron microscope (SEM).</p> <p>The JEOL CP produces precise cross sections of both soft and hard materials, as well as composites. Solder bumps, wirebonds, and thin film specimens are routinely prepared without distortion, making it possible to clearly image adhesions, interfaces, microstructures, metals distribution, and crystal structures for defect and failure analysis.</p> <p>More information on the CP can be found at <a href="/tabid/257/Default.aspx">http://www.jeolusa.com/tabid/257/Default.aspx</a>.</p> <p>JEOL, a leading global supplier of tungsten and field emission electron microscopes for research and defect analysis, will exhibit essential imaging solutions for the industry in booth #2566.</p> <p align="center"><img alt="" height="200" hspace="7" src="/Portals/2/Press/wirebond.jpg" vspace="7" width="250" /><br /> <img alt="" height="200" hspace="7" src="/Portals/2/Press/solderbump.jpg" vspace="7" width="250" /></p> 41