JEOL USA JEBG Series / Electron Beam Sources

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JEBG Series / Electron Beam Sources

JEBG Electron Beam Sources employ electron sources for electron beam evaporation, which offer optimum selections for production of optical thin films, thin films for optoelectronic, semiconductor thin films, and thick films.


JEBG-303UA	EBG-203UB6S	EBG-102UB6S

JEBG Series Key Product Features

Model	Output ANGLE	Deflection	Scanning	Crucible (mL)	Applications**
BS-60050EBS	10kW	270°	High speed	Option	A/B/C/D
BS-60040VDGN	10kW	270°	High speed	Option	A/B/C/D
BS-60030DGN	10kW	270°	High speed	Option	A/B/C/D
EBG-102UB6S	10kW	180°	High speed	12 x 6	A/B
EBG-102UB4S	10kW	180°	High speed	12 x 4	A/B
JEBG-102UHO	10kW	180°	High speed	Option	A/B
EBG-203UB6S	20kW	270°	High speed	12 x 6	A/B/C
EBG-203UB4H	20kW	270°	High speed	12 x 2 30 x 2	B/C/D
JEBG-203UA0	20kW	270°	High speed	Option	A/B/C/D
JEBG-163MB	16kW	270°	-	60 x 1	C/D
JEBG-303UA	30kW	270°	High speed	Option	A/B/C/D

** Applications Legend:

A: Optical thin film
B: Optoelectronic thin film
C: Semiconductor thin film
D: Thick film