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JEBG Series / Electron Beam Sources

JEBG Electron Beam Sources employ electron sources for electron beam evaporation, which offer optimum selections for production of optical thin films, thin films for optoelectronic, semiconductor thin films, and thick films.

JEBG-303UA EBG-203UB6S EBG-102UB6S
JEBG-303UA EBG-203UB6S EBG-102UB6S

JEBG Series Key Product Features

Model Output
ANGLE		 Deflection Scanning Crucible
(mL)		 Applications**
BS-60050EBS 10kW 270° High speed Option A/B/C/D
BS-60040VDGN 10kW 270° High speed Option A/B/C/D
BS-60030DGN 10kW 270° High speed Option A/B/C/D
EBG-102UB6S 10kW 180° High speed 12 x 6 A/B
EBG-102UB4S 10kW 180° High speed 12 x 4 A/B
JEBG-102UHO 10kW 180° High speed Option A/B
EBG-203UB6S 20kW 270° High speed 12 x 6 A/B/C
EBG-203UB4H 20kW 270° High speed 12 x 2
30 x 2		 B/C/D
JEBG-203UA0 20kW 270° High speed Option A/B/C/D
JEBG-163MB 16kW 270° - 60 x 1 C/D
JEBG-303UA 30kW 270° High speed Option A/B/C/D

** Applications Legend:

A: Optical thin film
B: Optoelectronic thin film
C: Semiconductor thin film
D: Thick film