2017

• 50th anniversary of JEOL e-beam lithography systems
• Introduction of new 8100FS Direct Write EBL

2016

• 50th Anniversary of first JEOL SEM - more than 22,000 sold worldwide since 1966
  

2015

• 10th Anniversary of introduction of award-winning DART™ Direct Analysis in Real Time ion source
• New "best-in-class" Field Emission SEM JSM-7200F and new versatile, compact tungsten SEM IT100 series introduced
• JEOL introduces new generation InTouchScope IT100 Series SEM

2014

• Introduction of Grand ARM 300kV TEM with 63pm resolution
• JEOL USA launches Image Contest
• New ECZ Series NMR Spectrometer introduced

2013

• New Zero Boiloff Magnet for NMR
• JEOL and Zoex Partner to Offer Two-Dimensional Gas Chromatography (GCxGC) for High Sensitivity Mass Spectrometer AccuTOF-GCx
• JEOL partners with Gatan to offer Serial Block Face Imaging for SEM
• 1400PLUS 120kV TEM, IT300 extended pressure SEM introduced

2012

• JEOL USA celebrates its 50th anniversary
• JEOL Brasil moves to new office
• JEOL introduces new Field Emission SEM series with sub-1 nm imaging capabilities and analytical characterization at the sub-100nm scale
• Fast, small solid state NMR probe introduced

2011

• 1000 Cross Section Polishers sold worldwide for sample preparation
• 100 JEM-1400 TEMs sold worldwide
• JEOL USA receives its 11th Omega Award for outstanding service
• R&D 100 Award goes to InTouchScope (JSM-6010) SEM
• MT10-Award goes to ClairScope atmospheric SEM
• JEOL chemist receives prestigious Anachem Award
• New Chilean partner, Arquimed, announced
• Environmental Control System for labs introduced
• Large Angle SDD-EDS for TEM introduced
• Joint venture company, JEOL Resonance, formed for NMR and ESR

2010

• R&D 100 Award goes to ClairScope atmospheric SEM
• JEOL receives 10th Omega award for customer service
• JEOL offers first commercially available thin film phase plate technology for TEM

2009

• JEOL receives 9th Omega award for customer service
• JEOL introduces ClairScope, JASM-6200, first integrated correlative microscopy tool
• JEOL introduces JEM-ARM200F, atomic resolution analytical microscope with STEM-HAADF resolution of 0.08 nm

2008

• JEOL receives 8th Omega award for customer service
• JEOL introduces benchtop SEM with LV and high resolution

2007

• JEOL ships 10,000th SEM unit from Technics group in Japan
• JEOL receives 7th Omega award for customer service
• Cross-Atlantic operation of JEOL aberration-corrected TEM
• JEOL TEMs installed in BioSafety Level 3 Lab
• JEOL introduces cyber-enabled NMR

2006

• Minimum linewidths of 8nm achieved with direct write lithography system
• New ultrahigh resolution FE SEM achieves true 1,000,000X imaging
• JEOL speeds NMR experiments with ability to perform DART mass analysis directly from NMR tube
• JEOL announces untethered TEM – on-the-go microscopy with cellular connection

2005

• Direct Analysis in Real Time (DART™) revolutionizes mass spectrometry
• DART wins Pittcon Editors’ Gold Award, R&D 100 Award
• 360° wafer edge review improves yield with wafer analysis SEMs
• Sirius remote TEM operation software lets scientists see atoms from halfway around the world
• JEOL USA named Major Industrial Partner with MIT’s Institute for Soldier Nanotechnologies
• DART appears on popular crime television show CSI
• U.S. Patent awarded for DART
• JEOL receives 5th consecutive Omega award for outstanding service

2004

• Argon beam cross section polisher introduced to prepare distortion-free SEM samples
• GCMate II mass spectrometer used in analysis of antioxidants in blueberries
• New Electron Probe Microanalyzer (EPMA) maps with analytical resolution approaching 100nm
• JEOL receives 4th consecutive Omega award for outstanding service

2003

• Automated structural elucidation software for NMR introduced
• Cs corrected SEM developed – JSM-7700F
• JEOL receives 3rd consecutive Omega Award for outstanding service
• Cross-section FIB/STEM solution introduced
• Introduced ultrahigh resolution TEM – JEM-2100F
• ColdSpray ionization source introduced for AccuTOF MS
• New CD Metrology Software announced for JEOL SEMs
• New SPM introduced for native environment imaging – JSPM-5200
• JEOL Ltd. ISO 14001 certified

2002

• TEEMmate mass spectrometer for explosives introduced
• Pleasanton, California Demo Facility Opened
• Robert Santorelli appointed JEOL USA President/COO
• Gentle Beam technology introduced with new JSM-7400F SEM
• New generation of high resolution SEMs introduced  (JSM-6360 /LV and JSM-6460 /LV)
• New generation of NMR spectrometers introduced – ECA/ECX
• JEOL receives Omega Award for outstanding service
• APIA membership

2001

• New Time-of-Flight LC/MS AccuTOF™ introduced
• JEOL receives Omega Award for outstanding service

2000

• I-Checker Wafer Process Monitor introduced
• New multipurpose lithography/inspection SEM (6500F)

1999

• JEOL celebrates 50th Anniversary
• Winner of VLSI Research Top Ten Award for service

1998

• Winner of VLSI Research Top Ten Award for service

1997

• Recipient of National Semiconductor Silver Award

1989

• First JEOL SPM introduced

1982

• First JEOL Wafer Inspection System

1979

• JEOL USA, Inc. moved to new Peabody, MA headquarters

1974

• Soquelec, Ltd. becomes JEOL representative in Canada

1967

• First JEOL e-beam lithography system introduced

1966

• First JEOL SEM introduced

1964

• First JEOL MS introduced

1962

• JEOL shares listed on the Second Section of the Tokyo Stock Exchange
• JEOL CO (USA) INC. established as the first overseas subsidiary.

1961

• Akishima Factory Building No. 1 (South Wing) completed.
• Company name changed to JEOL Ltd.

1960

• First JEOL EPMA introduced

1956

• First JEOL NMR introduced

1950

• First JEOL TEM introduced

1949

• Japan Electron Optics Laboratory Co., Ltd. established in Mitaka, Tokyo.
• JEM-1 electron microscope completed.