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JEOL Milestones
2017
50th anniversary of JEOL e-beam lithography systems
Introduction of new 8100FS Direct Write EBL
2016
50th Anniversary of first JEOL SEM - more than 22,000 sold worldwide since 1966
2015
10th Anniversary of introduction of award-winning DART™ Direct Analysis in Real Time ion source
New "best-in-class" Field Emission SEM JSM-7200F and new versatile, compact tungsten SEM IT100 series introduced
JEOL introduces new generation InTouchScope IT100 Series SEM
2014
Introduction of Grand ARM 300kV TEM with 63pm resolution
JEOL USA launches Image Contest
New ECZ Series NMR Spectrometer introduced
2013
New Zero Boiloff Magnet for NMR
JEOL and Zoex Partner to Offer Two-Dimensional Gas Chromatography (GCxGC) for High Sensitivity Mass Spectrometer AccuTOF-GCx
JEOL partners with Gatan to offer Serial Block Face Imaging for SEM
1400PLUS 120kV TEM, IT300 extended pressure SEM introduced
2012
JEOL USA celebrates its 50th anniversary
JEOL Brasil moves to new office
JEOL introduces new Field Emission SEM series with sub-1 nm imaging capabilities and analytical characterization at the sub-100nm scale
Fast, small solid state NMR probe introduced
2011
1000 Cross Section Polishers sold worldwide for sample preparation
100 JEM-1400 TEMs sold worldwide
JEOL USA receives its 11th Omega Award for outstanding service
R&D 100 Award goes to InTouchScope (JSM-6010) SEM
MT10-Award goes to ClairScope atmospheric SEM
JEOL chemist receives prestigious Anachem Award
New Chilean partner, Arquimed, announced
Environmental Control System for labs introduced
Large Angle SDD-EDS for TEM introduced
Joint venture company, JEOL Resonance, formed for NMR and ESR
2010
R&D 100 Award goes to ClairScope atmospheric SEM
JEOL receives 10th Omega award for customer service
JEOL offers first commercially available thin film phase plate technology for TEM
2009
JEOL receives 9th Omega award for customer service
JEOL introduces ClairScope, JASM-6200, first integrated correlative microscopy tool
JEOL introduces JEM-ARM200F, atomic resolution analytical microscope with STEM-HAADF resolution of 0.08 nm
2008
JEOL receives 8th Omega award for customer service
JEOL introduces benchtop SEM with LV and high resolution
2007
JEOL ships 10,000th SEM unit from Technics group in Japan
JEOL receives 7th Omega award for customer service
Cross-Atlantic operation of JEOL aberration-corrected TEM
JEOL TEMs installed in BioSafety Level 3 Lab
JEOL introduces cyber-enabled NMR
2006
Minimum linewidths of 8nm achieved with direct write lithography system
New ultrahigh resolution FE SEM achieves true 1,000,000X imaging
JEOL speeds NMR experiments with ability to perform DART mass analysis directly from NMR tube
JEOL announces untethered TEM – on-the-go microscopy with cellular connection
2005
Direct Analysis in Real Time (DART™) revolutionizes mass spectrometry
DART wins Pittcon Editors’ Gold Award, R&D 100 Award
360° wafer edge review improves yield with wafer analysis SEMs
Sirius remote TEM operation software lets scientists see atoms from halfway around the world
JEOL USA named Major Industrial Partner with MIT’s Institute for Soldier Nanotechnologies
DART appears on popular crime television show CSI
U.S. Patent awarded for DART
JEOL receives 5th consecutive Omega award for outstanding service
2004
Argon beam cross section polisher introduced to prepare distortion-free SEM samples
GCMate II mass spectrometer used in analysis of antioxidants in blueberries
New Electron Probe Microanalyzer (EPMA) maps with analytical resolution approaching 100nm
JEOL receives 4th consecutive Omega award for outstanding service
2003
Automated structural elucidation software for NMR introduced
Cs corrected SEM developed – JSM-7700F
JEOL receives 3rd consecutive Omega Award for outstanding service
Cross-section FIB/STEM solution introduced
Introduced ultrahigh resolution TEM – JEM-2100F
ColdSpray ionization source introduced for AccuTOF MS
New CD Metrology Software announced for JEOL SEMs
New SPM introduced for native environment imaging – JSPM-5200
JEOL Ltd. ISO 14001 certified
2002
TEEMmate mass spectrometer for explosives introduced
Pleasanton, California Demo Facility Opened
Robert Santorelli appointed JEOL USA President/COO
Gentle Beam technology introduced with new JSM-7400F SEM
New generation of high resolution SEMs introduced (JSM-6360 /LV and JSM-6460 /LV)
New generation of NMR spectrometers introduced – ECA/ECX
JEOL receives Omega Award for outstanding service
APIA membership
2001
New Time-of-Flight LC/MS AccuTOF™ introduced
JEOL receives Omega Award for outstanding service
2000
I-Checker Wafer Process Monitor introduced
New multipurpose lithography/inspection SEM (6500F)
1999
JEOL celebrates 50th Anniversary
Winner of VLSI Research Top Ten Award for service
1998
Winner of VLSI Research Top Ten Award for service
1997
Recipient of National Semiconductor Silver Award
1989
First JEOL SPM introduced
1982
First JEOL Wafer Inspection System
1979
JEOL USA, Inc. moved to new Peabody, MA headquarters
1974
Soquelec, Ltd. becomes JEOL representative in Canada
1967
First JEOL e-beam lithography system introduced
1966
First JEOL SEM introduced
1964
First JEOL MS introduced
1962
JEOL shares listed on the Second Section of the Tokyo Stock Exchange
JEOL CO (USA) INC. established as the first overseas subsidiary.
1961
Akishima Factory Building No. 1 (South Wing) completed.
Company name changed to JEOL Ltd.
1960
First JEOL EPMA introduced
1956
First JEOL NMR introduced
1950
First JEOL TEM introduced
1949
Japan Electron Optics Laboratory Co., Ltd. established in Mitaka, Tokyo.
JEM-1 electron microscope completed.
ABOUT US
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Working at JEOL
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