JEBG Series / High-Power Electron Beam Sources

JEBG Series / High Power Electron Beam Sources are designed to uniformly deposit metal oxides onto wide plastic films or steel plates in a continuous feed such as in magnetic tape manufacture for high-density recording or in wrapping-film manufacture with an oxide barrier function. Electron beam sources are also used for depositing of MgO film on plasma display panels and for development of surface-treated steel plates. Electron beam sources are also used for the melting of high-melting-point materials and high-purity metals.

JEBG-3000UB

JEBG-1000UB

EBG-300UA

Please Note: Not all JEOL Industrial Equipment products are available in every country. For specific information and more details about JEOL products available in your area, contact the IE International Business Office at sales-ieg@jeol.co.jp. Thank you.

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High-Power Electron Beam Sources

Electron Beam Sources
- BS-60050EBS Electron Beam Source

EB Source Power Supply

Plasma Source

Rotary Sensor

Learn More

Download the JEBG-BS-JST-ST Series brochure

Key Features

Type of Source	Electron bombardment cathode self-accelerating type
	Max. output	Max. scan width	Max. scan frequency	Scan direction	Application power supply
JEBG-3000UB	300kW (40kV. 7.5A)	±500	200Hz	x and y	JST-300C
JEBG-1000UB	100kW (30kV. 3.4A)	±400	200Hz	x and y	JST-100C
EBG-300UA	30kW (20/15kV. 1.5A)	±350	300Hz	x and y	ST-30BE2

Videos

Watch our new video showing the JEOL High-power Electron Beam Source instrument undertaking vacuum melting of high-melting point metals. Also shows various beam irradiation patterns and areas that can be created with our dedicated control device and software.