BS-60050EBS Electron Beam Source with reduced backscattered electrons

  • BS-60050EBSElectron source minimizing backscattered electrons entering substrate.
  • Reduces film absorption.
  • External accelerating voltage selection while keeping high vacuum.
  • Wide beam scanning range up to 50 mm in diameter.
  • Incorporates a 270° permanent magnet, electromagnet, and long lasting filament.
  • Simple design featuring contamination resistance and easy maintenance.

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BS-60050EBS Key Product Features

Maximum power 10 kW (1A at 10 kV)
Accelerating voltage range -4 to -10 kV
Beam deflection angle 270° (permanent magnet and electromagnet used)
XY scan width Maximum 50 mm in diameter (at -6 kV)
XY movement Maximum 50 mm in diameter (at -6 kV)
Scan frequency X: 50 Hz; Y: 500 Hz
Working pressure 7.0x10-2 to 5.0x10-5 Pa
Cooling water 5 to 8 lit/min (temeperature 10 to 25°C)
Differential pressure: 0.15 to 0.3 MPa
Outer dimensions 177(W) x 284(D) x 140(H) mm
Weight Approx. 14kg
Applicable power supplies JST-3F, JST-10F, JST-16F

Please Note

Not all JEOL Industrial Equipment products are available in every country. For specific information and more details about JEOL products available in your area, contact the IE International Business Office at sales-ieg@jeol.co.jp. Thank you.