Representing 50 years of expertise in electron beam lithography, the all-new JEOL JBX-8100FS series spot beam lithography system is designed for higher throughput and lower operating costs.
The JBX-8100FS writes ultrafine patterns at a faster rate of speed while minimizing idle time, especially during the exposure process, thus increasing throughput.
This new, high precision compact e-beam tool is suitable for a wide range of applications from research to production, while its small footprint and low power consumption reduce cost of ownership.
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