Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
Nanoimprint lithography is an attractive technology for LSIs era below 40-nm critical dimension from the viewpoint of high-throughput and low-cost equipment. In order to avoid a pattern placement error due to thermal expansion in the conventional thermal imprint process, we attempted to replicate the mold pattern onto a liquid polymer, which was solidified using ultra-violet (UV) light irradiation at room temperature.