Nanolithography at the Jet Propulsion Laboratory, California Institute of Technology
The enabling tool for nano-lithography at JPL is the JEOL JBX-9300FS electron beam lithography system shown in the photo below. This state-of-the-art system is housed in JPL's Microdevices Laboratory, a 38,000-square-foot facility that includes cleanrooms for device processing, material deposition, and conventional laboratories for characterization.