Photomask / Direct Write Lithography Documents

JEOL Resources

rss

Documentation in support of your JEOL product.

Preparation of Diamond Mold using Electron Beam Lithography for Application to Nanoimprint Lithography

Diamond molds were fabricated by two types of fabrication processes, both of which use a conductive intermediate layer between the diamond surface and polymethylmethacrylate (PMMA) resist to prevent surface charge-up.

Attached Files
Showing 0 Comment


Comments are closed.
© Copyright 2024 by JEOL USA, Inc.
Terms of Use
|
Privacy Policy
|
Cookie Preferences