Photomask / Direct Write Lithography Documents


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Subwavelength, binary lenses at infrared wavelengths

We describe the nanofabrication of subwavelength, binary lenses in GaAs for operation in the infrared. Subwavelength surface relief structures create an artificial material with an effective index of refraction determined by the fill factor of the binary pattern and can be designed to yield high-efficiency diffractive optical elements.

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