Argon Beam Cross Sectioning October 20, 2020 Operation of CP, Sample Preparation 0 The new specimen preparation apparatus, the Cross Section Polisher (CP), utilizes a broad argon ion beam that eliminates problems associated with the conventional methods of specimen cross sectioning for SEM. The CP consists of a specimen chamber with a TMP vacuum system, an optical microscope for specimen positioning, and controllers for the vacuum system and a stationary ion beam. For full details: Attached files often contain the full content of the item you are viewing. Be sure and view any attachments. amp_article.pdf 326.15 KB Related Articles Cross Section Specimen Preparation Device Using Argon Ion Beam for SEM Scanning Electron Microscopes (SEMs) have been used for various applications, such as research and development and failure analysis. There are many cases where not only observation of a specimen surface – but also observation of a cross section – is important. Preparation of a cross section depends on the specimen structure, observation purpose, and materials. Various preparation methods are put into practice: cutting, mechanical polishing, microtome, and FIB (Focused Ion Beam) are the major methods. In this discussion, we evaluate a new cross section specimen preparation method using an argon ion beam (hereinafter called the Cross-section Polishing or CP method). We have found that this method is extremely useful for observation of layer structures, interfaces, and crystalline structures of metals, ceramics, and composites. Here, we introduce examples of applications to various types of specimens. Precise SEM Cross Section Polishing via Argon Beam Milling A new precision argon ion beam cross section polisher simplifies the preparation of samples and makes it possible to prepare truly representative cross sections of samples free of artifacts and distortion. Use of the broad argon ion beam eliminates the problems associated with conventional polishing and allows for larger specimens to be prepared with precision. New Methods for Cross-Section Sample Preparation Using Broad Argon Ion Beam (Paper Analysis) In 2006, we introduced a new specimen preparation apparatus, Cross-section Polisher (CP), which employs a broad argon ion beam to prepare cross-sections of specimens [1-2]. The principle of the CP is simple: a region of the specimen that is not covered by the masking plate is milled by an argon broad ion beam, as shown in Fig.1. The specimens with irregular shapes and rough surfaces that cannot be embedded prior to ion milling require additional care and consideration prior to ion-milling with CP. Precise SEM Cross Section Polishing via Argon Beam Milling Instrument overview, as seen in Microscopy Today. Pristine Sample Preparation Using Broad Ion Beam Traditional mechanical preparation of specimen surfaces suffers from various artifacts, such as scratches and embedded polishing media, that obscure the original microstructure, crystallographic information and precise layer thickness measurements. Broad ion beam polishing using the JEOL cross-section polisher (CP) offers pristine surface preparation with minimal artifacts. CP is a tabletop instrument that is ideally suited for preparation of a variety of environmentally-sensitive and beam-sensitive materials, including metals, polymers, ceramics and composites. The instrument includes both cryo-preparation (down to LN2temperature) and air-isolated transfer and preparation environment. Ion beam sputter coating with CROSS SECTION POLISHER™ CROSS SECTION POLISHER™ (CP) is an SEM specimen preparation device that utilized broad Ar ion beam to produce artifact-free cross-sections. The same principle can be employed not only for ion-milling but also deposition of thin layer to the specimen surface, in particular conductive coating for followup observation of a non-conductive specimen in an SEM. Showing 0 Comment Comments are closed.