Large area planar surface milling for 30mm diameter processing and minimizing curtaining effect
- |
- 1 MIN READ |
- 25 |
- February 23, 2026 |
- Applications, Sample Preparation |
-
Applications note IB2025-01
Planar surface milling is a sample sputtering method of continuously rotating a sample while irradiating an Ar ion beam at an adjusted irradiation angle. This method is mainly used as a finishing process for samples that have already been mirror-polished by mechanical polishing and is effectively applied in SEM observation and EBSD analysis.
While the processing range of mechanical polishing is typically 10mm Ø or larger, the sputtering range of conventional planar surface milling is about 5mm Ø. Therefore, there is a growing demand for expanding the sputtering range. However, there are technical challenges associated with expanding this range. In this study, we have explored a new approach to address these challenges.