Join Us at Microscopy & Microanalysis 2025!

Join us at M&M 2025 for an exciting look at our latest innovations! In Booth #1804, you will find three live instruments in action: the JSM-IT810 UHR FE-SEM, the JSM-IT710 FE-SEM, and the JEM-120i 120kV TEM. We are also featuring our tabletop tools, where you can explore our benchtop solutions and see our Cooling Cross Section Polisher on display. During the week, you won't want to miss our Lunch & Learn sessions and After-Hours tutorials hosted in the booth. Plus, be sure to stop by for a personalized portrait from our caricature artist— available daily during exhibit hours. 

Whether you're here to learn, explore our solutions, or connect with our team— we can’t wait to see you in Salt Lake City!
UHR Field Emission SEM

JSM-IT810

JSM-IT810
Ultrahigh resolution FE SEM with the most advanced high-resolution analytical technology available today.
Field Emission SEM

JSM-IT710HR

JSM-IT710HR
High resolution, large chamber FE SEM. Compact, versatile Field Emission SEM that offers Smart-Flexible-Powerful performance at a great value.
120kV TEM

JEM-120i

JEM-120i
Imaging and cryomicroscopy excellence in a compact and easy to use 120kV TEM.
Benchtop SEM

NeoScope™

JSM-IT710HR
Incorporates advanced technology and functions that make it simple for users at any skill level to obtain outstanding SEM images and elemental analysis results in minutes.
Sample Prep

Cooling CP

Cooling CP
For preparation and polishing of materials that are sensitive to thermal damage. Temperature control down to -120°C.

Product Videos

The JIB-PS500i: JEOL's Advanced FIB-SEM

The NeoScope™: Powerful Benchtop SEM

Hear from leaders in the field about the latest advancements in microscopy from JEOL. 

Using Fast Beam Blankers, Automation, and Information Theory for Smarter Electron Microscopy

Bryan Reed, Ides, Inc. | 5:45pm – 6:45pm | JEOL USA Booth #1804
It is well known that electrostatic beam blankers can dramatically outperform older magnetostatic systems. Electrostatic blankers can switch on the nanosecond scale, with zero hysteresis. This means cleanly turning the beam on and off at will, fast enough that transients simply don’t matter on typical time scales for electron microscopy, without worrying about the effect on image quality. What is perhaps more surprising is just how much difference this makes in the operation of the instrument, especially when aiming to optimize the ratio of acquired information to specimen damage. Eliminating dose during STEM flyback and interpixel transients becomes routine, as does using pulse width modulation to radically vary the beam current without affecting focus or alignment. These capabilities alone enable measurements that would otherwise be very challenging. But electrostatic blankers can do a great deal more, especially when designed for integration with complex automation and novel workflows. Integrating with the timing system of a scan controller enables “dose painting,” independently specifying the dose in every single pixel of a scan. This can be done adaptively, using previous acquisitions to decide how to apportion dose in space and time to measure what you want while damaging the sample as little as possible. This can be done frame by frame using advanced algorithms. It even can be done in real time, during each pixel, blanking the beam whenever an information threshold is reached and further dose would needlessly damage the simple while adding little new information. Together with new automation capabilities including improved drift correction during spectrum imaging and tools for easily defining new operating modes and workflows, fast blanking technology can fundamentally change the way you interact with your microscope.

IDES is a leader and pioneer in the field of Ultrafast and Dynamic TEM, specializing in pulsed lasers and high-speed electrostatic beam blanking and deflection technologies. To learn more, click here.
EDS and FE-SEM

Lunch and Learn: Next Generation X-ray Analysis with the IT810 series FESEM: From Lithium Detection to Nanostructure Characterization

Dr. Jennifer Misuraca, FE-SEM Product Manager at JEOL USA | 12:00pm – 1:00pm | JEOL USA Booth #1804
Versatility and high spatial resolution meet automation and ease of use with the JSM-IT810 series FE-SEM, streamlining operation and workflow efficiency. The integrated Gather-X windowless energy-dispersive (EDS) detector is embedded within the JEOL FE-SEM software interface, ensuring safe operation and high sensitivity at the short working distances required for achieving ultra-high spatial resolution. It is ideal for higher sensitivity analyses, higher spatial resolution mapping, and the detection of lower energy X-rays down to Lithium. This detector enables higher count rates allowing for fast collection times, minimizing potential beam damage with sensitive specimens. This innovative technology enables collection of the entire range of X-rays using electron beam voltages up to 30kV, with improved detection sensitivity for characteristic X-rays less than 1 keV and the ability to detect soft X-rays less than 100eV, including Lithium Kα. Another advanced option available for the IT810 is the Soft X-ray Emission Spectrometer (SXES), a cutting-edge type of wavelength dispersive spectrometer (WDS). It employs a variable space grating to enable efficient parallel collection of soft X-rays, making it particularly effective for detecting trace amounts of light elements. Beyond elemental analysis, the SXES can distinguish between conduction and valence band electron emissions, revealing subtle differences in bonding and crystal structure—even in materials composed of the same elements. This capability allows for detailed chemical state analysis.
In this Lunch and Learn, the features of the IT810 will be presented along with analysis examples using these two novel X-ray detectors. Examples include analyses of Li-ion battery materials, all solid-state battery devices, semiconductor devices, and nanoparticles. When utilized together, the Gather-X and SXES detectors can provide a comprehensive analysis of a material’s electronic and chemical properties.
Atomic Resolution Imaging

After Hours: MARS - The Magnetic field-free Atomic Resolution imaging System

Professor Shibata, University of Tokyo and Patrick Phillips, FIB/TEM Product Manager at JEOL USA | 5:45pm – 6:45pm | JEOL USA Booth #1804 
The JEM-Z200MF is an electron microscope with magnetic field-free objective lens which enables high resolution observation without applying strong magnetic field to specimens. Combined with a higher-order aberration corrector, atomic resolution imaging is possible. More information to come soon. To learn more about MARS, click here. 
FIB-SEM

Lunch and Learn: JEOL's Dual-Beam FIB/SEM for TEM sample preparation

Patrick Phillips, FIB and TEM Product Manager at JEOL USA and Wataru Shigeyama | 12:00pm – 1:00pm | JEOL USA Booth #1804
The recently-released JIB-PS500i from JEOL Ltd. focuses on ease-of-use in the materials science sample preparation space. In many fields of materials science, such as battery, semiconductor, thin film, quantum, etc., site-specific analysis is critical. Be it for chemical, structural, or electronic characterization of defects and interfaces, it is oftentimes necessary to identify a TEM sample region of interest on the nanometer scale. The dual-beam focused ion beam/scanning electron microscope (FIB/SEM) remains the typical instrument for this type of TEM sample preparation. The JIB-PS500i aims to streamline lamella preparation workflow while simultaneously improving the quality of the lamellae.

Owing to a large, high-tilt and flexible chamber design, a user is able to seamlessly switch between processing and imaging to observe the lamella quality during preparation. SEM and FIB column improvements enable low kV imaging and processing for damage reduction/sample thinning. Furthermore, a newly designed double tilt cartridge transfers between the FIB/SEM stage and TEM without requiring lamella grid removal or remounting. Automated software routines streamline the lamella preparation workflow for throughput and ease-of-use.

After Hours: Efficient Simultaneous Signal Acquisition in a Scanning Transmission Electron Microscope via a JEOL FEMTUS System

Professor Masashi Watanabe, Lehigh University | 5:45pm-6:45pm | JEOL USA Booth #1804
Once an electron-transparent thin specimen is examined in a scanning transmission electron microscope (STEM), various signals can be generated. These signals can be utilized for several different purposes by using different types of signal detectors. For example, direct and deflected electrons can be used for microstructure observation via bright-field and dark-field imaging, respectively, and/or structural examinations via the 4D-STEM approach. Signals caused by inelastic scattering of the incident electrons with the specimen, such as energy-loss electrons and characteristic X-ray, offer elemental/chemical information at a beam position through electron energy-loss spectrometry (EELS) and X-ray energy dispersive spectrometry (XEDS). Since these signals are generated simultaneously, it is very important to acquire them by multiple detectors at once for efficient characterization of materials. The newly developed JEOL FEMTUS system is one of the platforms to offer simultaneous signal acquisitions for efficient materials characterization. In fact, through the newly developed JEOL FEMTUS data acquisition/analysis platform, simultaneous XEDS and high-energy EELS spectrum-imaging (SI) datasets can be obtained together with dark-field STEM images. The FEMTUS system offers 4D-STEM data acquisition as well. In this talk, the simultaneous data acquisition and analysis capabilities in the FEMTUS system will be shown.

Monday July 28, 2025

3:00 PM - 5:00 PM | Poster | Session C07.P1
Differential Phase Contrast using Precession Illumination at pn Junction in GaA
Hayato Miura
3:00 PM - 5:00 PM
Advanced Characterization of Multilayer Films Using Combined SEM-EDS-Raman Approach 
Naoki Kikuchi
3:00 PM - 5:00 PM | Session A01.P1
Exploring Three-Dimensional Cathodoluminescence Technique with FIB-SEM
Yuhei Nakajima
3:00 PM - 5:00 PM
Electron Pair Distribution function(ePDF) analysis using precession electron diffraction of carbon and its allotropes
Keiichi Fukunaka

Tuesday July 29, 2025

3:00 PM - 5:00 PM | Session B08.P1
Development of several workflows for the cryo-FIB/TEM
Naoki Hosogi

Wednesday July 30, 2025

8:30 AM - 10:00 AM | Poster | Session A07.1
A novel method for reducing charging in SEM by simultaneous irradiation with an electron beam and VUV light
Noriyuki Inoue
9:30 AM – 9:45 AM | Session A07.P1
Dose control and pulse-counting imaging for SEM
Noriyuki Inoue
9:45 AM – 10:00 AM | Session C08.1
Development of a Retractable CMOS Camera for Transmission Electron Microscope
Wataru Yajima
10:30 AM – 10:45 AM
Introduction of Python®† scripting for TEM control by using PyJEM library
Eiji Okunishi
11:00 AM – 11:15 AM | A07.P1
Dose control and pulse-counting imaging for SEM
Kenichi Tsutsumi
3:00 PM - 5:00 PM
Particle Analysis Method Using Multi-Segmented BED Signals for SEM
Kei Nagatomo
3:00 PM - 5:00 PM | P08.P3
Mineralogical comparison between crocidolite and amosite asbestos using atomic resolution scanning transmission electron microscopy
Ichiro Onishi

Thursday July 31, 2025

3:00 PM - 5:00 PM | Poster
New Integrated Software for Soft X-ray Emission Spectrometer in EPMA System
Naoki Nakamura

Prof. Naoya Shibata

University of Tokyo 

Dr. Jennifer Misuraca

FE-SEM Product Manager, JEOL USA

Bryan Reed

IDES, Inc.

Masashi Watanabe

Lehigh University

Patrick Phillips

TEM/FIB Product Manager, JEOL USA

Eiji Okunishi

JEOL LTD.

Ichiro Onishi

JEOL LTD.

Wataru Yajima

JEOL LTD.

Hayato Miura

JEOL LTD.

Naoki Hosogi

JEOL LTD.

Kenichi Tsutsumi

JEOL LTD.

Naoki Nakamura

JEOL LTD.

Yuhei Nakajima

JEOL LTD.

Noriyuki Inoue

JEOL LTD.

Kei Nagatomo

JEOL LTD.

Keiichi Fukunaga

JEOL LTD.

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