2008
- JEOL receives 8th Omega award for customer service
- JEOL introduces benchtop SEM with LV and high resolution
2007
- JEOL receives 7th Omega award for customer service
- Cross-Atlantic operation of JEOL aberration-corrected TEM
- JEOL TEMs installed in BioSafety Level 3 Lab
- JEOL introduces cyber-enabled NMR
2006
- Minimum linewidths of 8nm achieved with direct write lithography system
- New ultrahigh resolution FE SEM achieves true 1,000,000X imaging
- JEOL speeds NMR experiments with ability to perform DART mass analysis directly from NMR tube
- JEOL announces untethered TEM – on-the-go microscopy with cellular connection
2005
- Direct Analysis in Real Time (DART™) revolutionizes mass spectrometry
- DART wins Pittcon Editors’ Gold Award, R&D 100 Award
- 360° wafer edge review improves yield with wafer analysis SEMs
- Sirius remote TEM operation software lets scientists see atoms from halfway around the world
- JEOL USA named Major Industrial Partner with MIT’s Institute for Soldier Nanotechnologies
- DART appears on popular crime television show CSI
- U.S. Patent # 6,949,741 awarded for DART
- JEOL receives 5th consecutive Omega award for outstanding service
2004
- Argon beam cross section polisher introduced to prepare distortion-free SEM samples
- GCMate II mass spectrometer used in analysis of antioxidants in blueberries
- New Electron Probe Microanalyzer (EPMA) maps with analytical resolution approaching 100nm
- JEOL receives 4th consecutive Omega award for outstanding service
2003
- Automated structural elucidation software for NMR introduced
- Cs corrected SEM developed – JSM-7700F
- JEOL receives 3rd consecutive Omega Award for outstanding service
- Cross-section FIB/STEM solution introduced
- Introduced ultrahigh resolution TEM – JEM-2100F
- ColdSpray ionization source introduced for AccuTOF MS
- New CD Metrology Software announced for JEOL SEMs
- New SPM introduced for native environment imaging – JSPM-5200
- JEOL Ltd. ISO 14001 certified
2002
- TEEMmate mass spectrometer for explosives introduced
- Pleasanton, California Demo Facility Opened
- Robert Santorelli appointed JEOL USA President/COO
- Gentle Beam technology introduced with new JSM-7400F SEM
- New generation of high resolution SEMs introduced (JSM-6360 /LV and JSM-6460 /LV)
- New generation of NMR spectrometers introduced – ECA/ECX
- JEOL receives Omega Award for outstanding service
- APIA membership
2001
- New Time-of-Flight LC/MS AccuTOF™ introduced
- JEOL receives Omega Award for outstanding service
2000
- I-Checker Wafer Process Monitor introduced
- New multipurpose lithography/inspection SEM (6500F)
1999
- JEOL celebrates 50th Anniversary
- Winner of VLSI Research Top Ten Award for service
1998
- Winner of VLSI Research Top Ten Award for service
1997
- Recipient of National Semiconductor Silver Award
1989
- First JEOL SPM introduced
1982
- First JEOL Wafer Inspection System
1979
- JEOL USA, Inc. moved to new Peabody, MA headquarters
1974
- Soquelec, Ltd. becomes JEOL representative in Canada
1967
- First JEOL e-beam lithography system introduced
1966
- First JEOL SEM introduced
1964
1962
- JEOL shares listed on the Second Section of the Tokyo Stock Exchange
- JEOL CO (USA) INC. established as the first overseas subsidiary.
1961
- Akishima Factory Building No. 1 (South Wing) completed.
- Company name changed to JEOL Ltd.
1960
- First JEOL EPMA introduced
1956
- First JEOL NMR introduced
1950
- First JEOL TEM introduced
1949
- Japan Electron Optics Laboratory Co., Ltd. established in Mitaka, Tokyo.
- JEM-1 electron microscope completed.
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