2008

• JEOL receives 8th Omega award for customer service
• JEOL introduces benchtop SEM with LV and high resolution

2007

• JEOL receives 7th Omega award for customer service
• Cross-Atlantic operation of JEOL aberration-corrected TEM
• JEOL TEMs installed in BioSafety Level 3 Lab
• JEOL introduces cyber-enabled NMR

2006

• Minimum linewidths of 8nm achieved with direct write lithography system
• New ultrahigh resolution FE SEM achieves true 1,000,000X imaging
• JEOL speeds NMR experiments with ability to perform DART mass analysis directly from NMR tube
• JEOL announces untethered TEM – on-the-go microscopy with cellular connection

2005

• Direct Analysis in Real Time (DART™) revolutionizes mass spectrometry
• DART wins Pittcon Editors’ Gold Award, R&D 100 Award
• 360° wafer edge review improves yield with wafer analysis SEMs
• Sirius remote TEM operation software lets scientists see atoms from halfway around the world
• JEOL USA named Major Industrial Partner with MIT’s Institute for Soldier Nanotechnologies
• DART appears on popular crime television show CSI
• U.S. Patent # 6,949,741 awarded for DART
• JEOL receives 5th consecutive Omega award for outstanding service

2004

• Argon beam cross section polisher introduced to prepare distortion-free SEM samples
• GCMate II mass spectrometer used in analysis of antioxidants in blueberries
• New Electron Probe Microanalyzer (EPMA) maps with analytical resolution approaching 100nm
• JEOL receives 4th consecutive Omega award for outstanding service

2003

• Automated structural elucidation software for NMR introduced
• Cs corrected SEM developed – JSM-7700F
• JEOL receives 3rd consecutive Omega Award for outstanding service
• Cross-section FIB/STEM solution introduced
• Introduced ultrahigh resolution TEM – JEM-2100F
• ColdSpray ionization source introduced for AccuTOF MS
• New CD Metrology Software announced for JEOL SEMs
• New SPM introduced for native environment imaging – JSPM-5200
• JEOL Ltd. ISO 14001 certified

2002

• TEEMmate mass spectrometer for explosives introduced
• Pleasanton, California Demo Facility Opened
• Robert Santorelli appointed JEOL USA President/COO
• Gentle Beam technology introduced with new JSM-7400F SEM
• New generation of high resolution SEMs introduced  (JSM-6360 /LV and JSM-6460 /LV)
• New generation of NMR spectrometers introduced – ECA/ECX
• JEOL receives Omega Award for outstanding service
• APIA membership

2001

• New Time-of-Flight LC/MS AccuTOF™ introduced
• JEOL receives Omega Award for outstanding service

2000

• I-Checker Wafer Process Monitor introduced
• New multipurpose lithography/inspection SEM (6500F)

1999

• JEOL celebrates 50th Anniversary
• Winner of VLSI Research Top Ten Award for service

1998

• Winner of VLSI Research Top Ten Award for service

1997

• Recipient of National Semiconductor Silver Award

1989

• First JEOL SPM introduced

1982

• First JEOL Wafer Inspection System

1979

• JEOL USA, Inc. moved to new Peabody, MA headquarters

1974

• Soquelec, Ltd. becomes JEOL representative in Canada

1967

• First JEOL e-beam lithography system introduced

1966

• First JEOL SEM introduced

1964

• First JEOL MS introduced

1962

• JEOL shares listed on the Second Section of the Tokyo Stock Exchange
• JEOL CO (USA) INC. established as the first overseas subsidiary.

1961

• Akishima Factory Building No. 1 (South Wing) completed.
• Company name changed to JEOL Ltd.

1960

• First JEOL EPMA introduced

1956

• First JEOL NMR introduced

1950

• First JEOL TEM introduced

1949

• Japan Electron Optics Laboratory Co., Ltd. established in Mitaka, Tokyo.
• JEM-1 electron microscope completed.