The development and subsequent application of new materials depends on a fundamental understanding of their structure and properties, and the bonding between atoms. JEOL SEMs, TEMs, Microprobes, and Auger microscopes, as well as cross sectional specimen preparation devices, mass spectrometer and NMR spectrometers are all used in the characterization of materials. Microstructural information and surface/bulk chemical analyses are readily obtained from these instruments with absolutely state-of-the-art results. Hard, soft, magnetic, frozen, and composite materials can easily be examined. Experiments involving variations in specimen temperature and ambient gas pressure, specimen straining, and changes in electrical bias or magnetic field can all be accomplished with special optional stages and feedthroughs. Solid-state NMR techniques can be used to characterize microscopic chemical structures.
JEOL instrumentation is unmatched for atomic resolution imaging. The ultrastable electron column and high resolution of the ARM200F aberration-corrected TEM push materials research to new frontiers. The unrivaled raw data from the ARM200F demonstrate never-before-seen imaging resolution plus high spatial resolution for chemical analysis. The ARM200F features an all-new shielded electron column design that surpasses all other TEM designs today. Now outfitted with the optional and field-retrofittable Cold FEG, the ARM200F’s ultrahigh imaging resolution is guaranteed at 78 picometers with an energy resolution of 0.3 eV.
JEOL TEMs and SEMs have long been used to benefit advanced research as well as failure analysis. In the 1980s, a JEOL high resolution TEM validated the structure of C60 and helped lead to early discoveries in carbon nanotubes. Nobel prize winners, recipients of major research grants, and world-renowned scientists have used JEOL instruments in their advanced research.
Versatile SEM/FIB tools, like the JEOL MultiBeam, allow simultaneous viewing, analysis, and micro milling functions, and serial slicing and sampling (S3) for monitoring, slicing, fabrication and reconstruction of specimens in 3D.
JEOL’s expertise in e-beam lithography expands the capability of the Field Emission SEM to allow for direct write patterning and gas-assisted e-beam lithography. In the 1960s, direct write e-beam was used for writing IC circuits on small wafers for a dedicated application. Now it is used in a myriad of applications from photonics and DNA filters to nano-fluidics, nano-gap patterns, and single electron transistors.
For more information on toroidal resonators and the Armani research lab, click here.
Pristine cross sections of all types of materials are easily prepared with JEOL ion beam tools. Hard, soft, magnetic, frozen, and composite materials are routinely cross sectioned with distortion-free results using the JEOL argon beam Cross Section Polisher or JEOL Multibeam SEM-FIB. Experiments involving variations in specimen temperature and ambient gas pressure, specimen straining, and changes in electrical bias or magnetic field can all be accomplished with special optional stages and feedthroughs.
Development of new materials can drive the creation of new products and industries, or answer the need for better performance, longevity of products, and a new generation of styles and designs.