Ion beam sputter coating with CROSS SECTION POLISHER™ February 19, 2021 Sample Preparation 0 Utilize your CP for sputter coating CROSS SECTION POLISHERTM (CP) is an SEM specimen preparation device that utilizes a broad Ar ion beam to produce artifact-free cross-sections. The same principle can be employed not only for ion-milling but also deposition of thin layer to the specimen surface, in particular, conductive coating for followup observation of a non-conductive specimen in an SEM. Figure 1(a) shows the principle of ion beam sputter coating. The target material is irradiated by the ion beam, instead of the specimen, creating a cone of sputtered material that is deposited on the specimen surface in a form of thin conductive coating. Figure 1(b) shows the carbon-coating holder (IB-12510CCH), that uses a carbon planchette as a target. Typically, this holder is only for the carbon coating; however, it can also be used for metal coating, simply by attaching a Au/Pd or other metal target (example shown is Fig. 2). Figure 1: Schematic of ion beam sputter coating by CROSS SECTION POLISHER™ (CP). (a) Principle of ion beam sputter coating, (b) Coating holder and targets. Figure 2: Gold coating results. (a) Au coated area on Si wafer. (b) Cross section image of Au coated layer made by CP. Figure 2 (a) shows the surface image of gold coated area on Si wafer. Coating condition is accelerating voltage 6 kV, irradiated ion current 130 µA and process time 3 minutes. Figure 2(b) shows the cross-section image of gold coated layer made by CP. The resulting coating thickness is 10 nm gold layer on Si wafer. This uniform layer provides good electric conductivity. The advantages of this method: No need for a dedicated sputter coater. CP can perform both polishing and coating. Adjust layer thickness by changing accelerating voltage and process time. Both carbon and metal thin layer can be deposited. For full details: Attached files often contain the full content of the item you are viewing. Be sure and view any attachments. AU_coating_by_CP_Tech_Note_02042021 (002).pdf 476.8 KB Related Articles Clean Cross Section Preparation with the SM-09010 Cross Section Polisher The cross section polisher (CP), which is supported by the patented technology developed by JEOL, makes a cross section perpendicular to the surface of a specimen. This is suitable for measurement of multi-layered structures. High Quality Cross Sections of Low Melting Point Samples Prepared with Cryo Ion Slicer – Broad Ar Ion Beam Milling Apparatus with a Newly Developed Specimen Cooling Unit Ion Slicer (IS) is an instrument used to prepare TEM lamellas and SEM cross-sections by employing an Ar broad ion beam. The IS has been getting quite popular in TEM and SEM laboratories because of its ease of use and high quality results. However, it is difficult to mill low melting point materials by the Ar broad ion beam because of thermal damage during the milling. Therefore, we have developed a specimen cooling unit for the IS. This cooling unit keeps specimen at low temperature during the ion milling to avoid the thermal damage. We named this system Cryo Ion Slicer(CIS). New Cross-Section Sample Preparation Method Applied to Microstructural and Chemical Investigation of Steel Coatings using FE-SEM Steel strips coated with Al-43.5Zn-1.5Si (Galvalume) alloy exhibit superior corrosion resistance as compared to Zn galvanized steel strips. The continuous hot-dip coating process used to produce such coatings entails a metallurgical reaction between the steel strip and Al-Zn-Si liquid alloy that leads to formation of an intermetallic compound layer at the steel-coating interface. Formability of the coated strip depends strongly on the morphology, dimensions (thickness) and chemical nature of this intermetallic layer. Proper characterization of the intermetallic layer structure and chemistry and the nucleation sites on the steel surface is therefore of paramount importance for the development of formable Galvalume coated steel strips. This requires preparation of artifact free cross-sectional samples. Such samples can be obtained using JEOL Cross-section Polisher (CP). Unlike mechanical sample preparation techniques that introduce significant amount of strain and possible artifacts due to preferential etching of various constituents, the CP uses a broad Ar beam and a rocking stage that minimize possible preferential etching and produces strain free cross-sections. In this paper, SEM images as well as chemical (EDS) data characterizing the interface layer between the steel strip and the Galvalume coating prepared using Cross-sectional Polisher are presented. Preparation of a High Quality Cross Section of a Bone Tissue for SEM - Application of the Cross-section Polisher to a Biological Specimen A bone tissue of a mouse tail, composed of hard and soft materials, was polished with the Cross-section Polisher (CP) for obtaining wide and smooth cross-section. The prepared specimen was observed with a SEM and analyzed with an EDS. Cross Section Specimen Preparation Device Using Argon Ion Beam for SEM Scanning Electron Microscopes (SEMs) have been used for various applications, such as research and development and failure analysis. There are many cases where not only observation of a specimen surface – but also observation of a cross section – is important. Preparation of a cross section depends on the specimen structure, observation purpose, and materials. Various preparation methods are put into practice: cutting, mechanical polishing, microtome, and FIB (Focused Ion Beam) are the major methods. In this discussion, we evaluate a new cross section specimen preparation method using an argon ion beam (hereinafter called the Cross-section Polishing or CP method). We have found that this method is extremely useful for observation of layer structures, interfaces, and crystalline structures of metals, ceramics, and composites. Here, we introduce examples of applications to various types of specimens. Pristine Sample Preparation Using Broad Ion Beam Traditional mechanical preparation of specimen surfaces suffers from various artifacts, such as scratches and embedded polishing media, that obscure the original microstructure, crystallographic information and precise layer thickness measurements. Broad ion beam polishing using the JEOL cross-section polisher (CP) offers pristine surface preparation with minimal artifacts. CP is a tabletop instrument that is ideally suited for preparation of a variety of environmentally-sensitive and beam-sensitive materials, including metals, polymers, ceramics and composites. The instrument includes both cryo-preparation (down to LN2temperature) and air-isolated transfer and preparation environment. Showing 0 Comment Comments are closed.