The JEM-9320FIB Focused Ion Beam System uses an ion beam generated from a gallium (Ga) liquid metal ion source to fabricate specimens. The improved ion optical system provides a high beam current (30nA) with an extremely small probe. The ion beam is focused using an electrostatic-lens system, and scanned over the specimen which then emits secondary electrons from the sample. The result is scanning ion microscope (SIM) images.
By adjusting the beam current, The JEM-9320FIB can perform high-speed, pinpoint fabrication of a specific area of the specimen by means of a concentrated scan with a rectangular, line or spot beam. The JEM-9320FIB can prepare thin-film STEM/TEM specimens from a wide variety of materials which would otherwise be difficult if not impossible to examine. In addition, it can also fabricate cross section specimens for SEM examination.
Features
- High-speed fabrication
- High ion beam current of 30nA @ 30kV
- Low accelerating voltage: 5kV
- Simple preparation of thin-film for STEM and TEM
- Side entry goniometer stage