p: (978) 535-5900     e: salesinfo@jeol.com

JSM-7800F Extreme-resolution Analytical Field Emission SEM

Industry-leading FE-SEM for any type of sample, any type of analysis

Fe3O4 nanoparticles

Immunogold-labeled cells

Polymer film, 100V image

Printer paper, 1kV, UED detector (BE mode)

Printer paper, 1kV, LED detector

Neodymium magnet (NdFeB) EBSD

Neodymium magnet (NdFeB) EDS

Steel weld, BEI image 5kV

Faujasite zeolite imaged in STEM mode, showing 0.74nm pore spacing


Industry-leading FE-SEM for any type of sample, any type of analysis

The JSM-7800F represents a significant leap forward in Field Emission SEM technology, with unmatched resolution and stability for imaging and analysis. JEOL's highest performance FE-SEM makes it possible to:

  • observe the finest structural morphology of nanomaterials at 1,000,000X magnification with sub-1nm resolution
  • collect large area EBSD maps at low magnifications without distortion
  • perform low kV imaging and analysis of highly magnetic samples.
  • image thin, electron transparent samples with sub 0.8 nm resolution using an optional retractable STEM detector
Optimized for extreme imaging and analysis

The JSM-7800F uniquely combines an in-lens field emission gun with an aperture angle control lens (ACL), optimizing large probe currents (up to 200 nA) for operation at the smallest probe diameter. The new super hybrid lens design allows high resolution imaging of any type of specimen. The SEM excels at low accelerating voltage X-ray spectroscopy and cathodoluminescence, combining large beam currents with a small interaction volume and dramatically increasing analytical resolution to the sub 100nm scale. Beam deceleration in GB Mode provides charge balance and extreme high resolution imaging of surfaces and nonconductive samples by effectively reducing effects of lens aberrations.

Ultimate versatility

The JSM-7800F is suitable for a wide variety of applications, from cryo-microscopy to electron beam lithography. It accommodates multiple analytical attachments, including EDS, WDS, STEM, BSE, CL, EBIC, and an IR camera and stage navigation camera. The SEM comes with a choice of three stage sizes and three specimen exchange airlock sizes. It can also be equipped with tensile, heating, and cooling stages for in situ experiments.

The system can be configured for low vacuum operation for imaging non-conductive samples.

JSM-7800F Details

  • The thermally-assisted Schottky gun maintains long-term beam stability for analysis as well as high beam current, high resolution, and low kV high resolution imaging. A battery backup system for the FEG gun is standard.
  • Through the unique ‘in-lens field emission gun’, the SEM delivers ≥ 200 nA of beam current to the sample. 
  • An aperture angle control lens (ACL) automatically optimizes both small probe current spot size for high resolution imaging and spot shape for high beam current, high resolution microanalysis.
  • The super hybrid objective lens forms no magnetic field around the sample, so magnetic samples can be analyzed without restriction.
  • A beam deceleration mode curtails charging on nonconductive specimens such as ceramics, semiconductors and polymers.
  • Imaging down to 10V.
  • The system comes standard with a turbo molecular pump (TMP) and a rapid specimen exchange airlock to assure a clean vacuum environment is always maintained. 
  • The five-axis specimen stage offers the ultimate in stability and is finely controlled with a high sensitivity trackball and touch pad. 
  • The Graphical User Interface can display up to four live images simultaneously and allows live signal mixing of up to four different signals. 
  • MS Windows 7® software in the host computer enables the user to set the SEM observation conditions, control the specimen-stage motor-drive, observe images and file data. 
  • Every stored image retains its specific set of operating conditions and stage coordinates, making it an ideal choice in the multi-user environment. 
  • For enhanced productivity, all image archiving, searching, measurement, report generation, filtering, and montaging can be conducted from the image database.

LV capability supports operation at low chamber vacuum (from 10 to 300 Pa) for the purpose of imaging and microanalysis of non-conductive samples. The LV configuration includes a retractable solid state backscattered electron detector. Via software control, both backscatter detector and LV orifice can be retracted without breaking chamber vacuum. This is a JEOL exclusive feature that guarantees unrestricted low magnification imaging and the ability to deliver maximum beam currents in HV operation. The system comes with an automatic pressure controller with motorized leak valve and uses dry nitrogen.

Low vacuum mode pressure 10 Pa ~ 300 Pa
Resolution in Low Vacuum mode Backscattered electron image: 1.5 nm (30 Pa, 30 kV)
Secondary electron image: 1.8 nm (60 Pa, 30 kV)
Maximum probe current
In high vacuum mode: 200 nA
In low vacuum mode: 20 nA
Orifice and BSE detector
LV BEI standard, LV SED option
Retractable in vacuum