JEOL USA Press Releases

24 Hours of Life Science Conference

On June 2, 2021, JEOL will focus on advances in life science research using electron microscopy in its “24 Hours of Life Science” conference. Twenty-four different sessions throughout the full day will cover topics including: - Connectomics and the study of complete volumes of tissues or materials captured at high resolution - Correlative microscopy using light microscopy and scanning electron microscopy to collect large areas of TEM-like data at multiple depths, overcoming the challenge of small ...
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JEOL USA Welcomes New Managing Director, Hidetaka Sawada

April 19, 2021 Peabody, Mass. -- JEOL USA welcomes a new Managing Director, Dr. Hidetaka Sawada, to its Peabody, Massachusetts office this April. Dr. Sawada is a world-renowned expert in aberration corrected electron microscopy. Most recently he served as General Manager of the Technical and Development group in the Electron Microscopy Business Unit of JEOL, Ltd. in Akishima, Japan. Dr. Sawada’s expertise includes the development and installation of the aberration-corrected (Cs) Transmission Electron Microscopes for ...

JEOL Announces 2020 Microscopy Image Grand Prize Winners

January 7, 2021, Peabody, Mass. - JEOL USA awarded two Grand Prizes to winners of its 2020 Electron Microscopy Image Contest, and kicked off its 2021 Image Contest at the beginning of the new year. The annual contest showcases JEOL microscope users’ artistically or esthetically pleasing images with good composition, sharp focus, and technical competency, especially in the use of accelerating voltage. The Grand Prize Transmission Electron Microscope (TEM) Image award was given to Lita ...
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JEOL Announces New High Throughput Analytical Transmission Electron Microscope

JEOL Ltd. (President Gon-emon Kurihara) announces the release of a new high throughput analytical electron microscope, JEM-ACE200F, to be released in December 2018.

JEOL Introduces World's Fastest Direct Write E-Beam Tool

May 16, 2017 (Peabody, Mass.) -- Since 1967, JEOL has been the industry leader in Electron Beam Lithography design and manufacturing. Now the company enters its 51st year in this field with the introduction of a new high throughput spot beam direct write system, the JBX-8100FS. This new generation of e-beam introduces the capability of writing ultrafine patterns at a high rate of speed directly onto substrates with minimum idle time during the exposure process. ...