JEOL USA Press Releases

Peabody, Mass., March 9, 2006 -- A new single-column focused ion beam (FIB) system from JEOL makes automated, high-speed specimen preparation affordable at nearly one-third the cost of dual beam FIBs. The JEOL JEM-9320 FIB prepares thin films and cross sections for failure and defect analysis at the nanoscale using S/TEM, TEM or surface observation. An ion beam current of 30nA at 30kV delivers fast, automated precise milling of specimens, which can be observed in ...

Peabody, Mass., February 14, 2006 – JEOL USA, a leading supplier of scientific and analytical instruments, has introduced a new series of high resolution tungsten scanning electron microscopes (SEMs) featuring multiple live image displays, streamlined graphical interface, and improved low kV operation. The new SEM series enables simultaneous observation of up to three different images (secondary electron, backscattered electron, and digital camera), on-screen measurement, and smart settings for simplified functionality. Secondary electron resolution is 3.0nm ...

Peabody, Mass., February 9, 2006 – Since capturing the Editor’s Gold Award for best new product at Pittcon 2005, the DART™ direct analysis ion source has found some unusual applications that, prior to this new technology, would have been virtually impossible. For example, fingerprints contain a great deal of chemical information that is not often exploited for forensic analysis. DART can detect and identify the chemical components of fingerprints, often providing information about specific substances ...

Peabody, Mass., December 7, 2005 – The USA subsidiary of JEOL Ltd., an international supplier of electron microscopes and analytical instruments, has entered into a partnership agreement with Massachusetts Institute of Technology’s Institute for Soldier Nanotechnologies (ISN). The mission of the ISN, a research collaboration between the United States Army and MIT, is to develop innovations in outfitting soldiers with equipment and apparel to dramatically improve their survivability and mobility. The use of nanotechnology will ...

Peabody, Mass., September 30, 2005 – JEOL USA today announced that the United States Patent Office has awarded patent number 6,949,741, dated September 27, 2005, to JEOL USA, Inc. for the DART™ Direct Analysis in Real Time atmospheric pressure ion source. The DART, commercially introduced in February 2005 for the JEOL AccuTOF™ mass spectrometer, was co-developed by Dr. Robert Cody of JEOL USA and Dr. James Laramee, a former consultant, now with EAI Corporation (a ...

Peabody, Mass., September 30, 2005 – The JEOL DART™, an ion source for the JEOL AccuTOF™ mass spectrometer, has been selected by R&D Magazine and an independent judging panel as one of the 100 most technologically significant products introduced into the marketplace in 2005. The DART, an acronym for Direct Analysis in Real Time, was developed by Dr. Robert (Chip) Cody of JEOL USA and Dr. James Laramee of EAI Corporation (a GEO-CENTERS, Inc. ...

Peabody, Mass., September 30, 2005 – JEOL, the industry-leading manufacturer of Transmission Electron Microscopes (TEMs), has developed a new capability known as Sirius which allows remote operation and imaging using the JEOL TEM. “Now you can see atoms from six thousand miles away,” says Dr. Mike Kersker, JEOL USA Vice President and Product Manager. “You don’t need to be seated at the TEM to run the experiments. Sirius is fully integrated with the JEOL ...

Peabody, Mass., July 15, 2005 – JEOL USA, Inc. has developed a unique solution for rapid, automated NMR spectrometer sample exchange. The new ASC24 24-position sample changer allows programmable, random order selection of sample tubes, improving NMR workflow for remote or unattended operation. An Ethernet interface enables plug and play installation, and controls are automatically updated whenever upgrades to the operating software, DELTA™, are installed. The lightweight aluminum carousel is interchangeable, making it possible to ...

Peabody, Mass., June 16, 2005 – JEOL will present a suite of solutions for critical analysis of wafer defects and nanometric designs at Semicon West 2005. From precision sample preparation to ultrahigh resolution imaging at the nanoscale, JEOL semiconductor tools are designed for today’s most advanced processes. Cross Section Polisher Sample Preparation On display in the Final Manufacturing section of Semicon West is JEOL’s new cross section polisher for scanning electron microscope (SEM) sample prep. ...