JEOL USA Press Releases

DART™ Awarded U.S. Patent

Peabody, Mass., September 30, 2005 – JEOL USA today announced that the United States Patent Office has awarded patent number 6,949,741, dated September 27, 2005, to JEOL USA, Inc. for the DART™ Direct Analysis in Real Time atmospheric pressure ion source. The DART, commercially introduced in February 2005 for the JEOL AccuTOF™ mass spectrometer, was co-developed by Dr. Robert Cody of JEOL USA and Dr. James Laramee, a former consultant, now with EAI Corporation (a ...

JEOL DART™ Wins R&D 100 Award

Peabody, Mass., September 30, 2005 – The JEOL DART™, an ion source for the JEOL AccuTOF™ mass spectrometer, has been selected by R&D Magazine and an independent judging panel as one of the 100 most technologically significant products introduced into the marketplace in 2005. The DART, an acronym for Direct Analysis in Real Time, was developed by Dr. Robert (Chip) Cody of JEOL USA and Dr. James Laramee of EAI Corporation (a GEO-CENTERS, Inc. ...

JEOL Demonstrates Remote TEM Operation using New Sirius Enhancement

Peabody, Mass., September 30, 2005 – JEOL, the industry-leading manufacturer of Transmission Electron Microscopes (TEMs), has developed a new capability known as Sirius which allows remote operation and imaging using the JEOL TEM. “Now you can see atoms from six thousand miles away,” says Dr. Mike Kersker, JEOL USA Vice President and Product Manager. “You don’t need to be seated at the TEM to run the experiments. Sirius is fully integrated with the JEOL ...

New Solution for Automated NMR Sample Exchange

Peabody, Mass., July 15, 2005 – JEOL USA, Inc. has developed a unique solution for rapid, automated NMR spectrometer sample exchange. The new ASC24 24-position sample changer allows programmable, random order selection of sample tubes, improving NMR workflow for remote or unattended operation. An Ethernet interface enables plug and play installation, and controls are automatically updated whenever upgrades to the operating software, DELTA™, are installed. The lightweight aluminum carousel is interchangeable, making it possible to ...

JEOL Displays Latest Imaging Solutions for Process Analysis at Semicon West 2005

Peabody, Mass., June 16, 2005 – JEOL will present a suite of solutions for critical analysis of wafer defects and nanometric designs at Semicon West 2005. From precision sample preparation to ultrahigh resolution imaging at the nanoscale, JEOL semiconductor tools are designed for today’s most advanced processes. Cross Section Polisher Sample Preparation On display in the Final Manufacturing section of Semicon West is JEOL’s new cross section polisher for scanning electron microscope (SEM) sample prep. ...
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