JEOL USA Press Releases

Cross Atlantic Operation of JEOL 2200FS Aberration Corrected Electron Microscope

One of the world's leading electron microscopes at Oak Ridge National Laboratory, the JEOL 2200FS Aberration Corrected Electron Microscope (ACEM), is controlled and manipulated from London via the Lambda Rail.

JEOL Puts Viruses Under the Microscope

The recent acquisition of Jeol's latest 300 kV field emission Transmission Electron Microscope (TEM), the JEM-3200FS, by Indiana University in the US for studying viruses is symptomatic of the ever increasing need for structural information about viruses to aid in the drug discovery process.

MIT and Boston Japanese Consulate Host President of Tohoku University

October 11, 2007 (Cambridge, Mass.) -- Massachusetts Institute of Technology and the Consulate General of Japan in Boston hosted a seminar on Advanced Materials presented by Professor Akihisa Inoue, President of Tohoku University of Japan. Prof. Inoue addressed an audience of MIT materials science students and faculty, as well as representatives from JEOL USA who assisted with the event, in an MIT lecture hall on Wednesday, September 19th. Marking the occasion of Tohoku University’s 100th ...

New Mass Spectrometry Newsletter from JEOL USA

October 2, 2007 (Peabody, Mass.) -- Get the latest in mass spectrometry applications and news from JEOL USA through its new online newsletter, Mass Media. Launched to meet the needs of the growing JEOL community of mass spec users, the newsletter includes links to newly-published papers by renowned scientists using JEOL mass spectrometers, new applications results, tutorials, and helpful tips for LC, GC, and direct analysis. In addition, unique research and applications are profiled and available ...

Award-winning Scientist Visits JEOL USA during ACS Boston Conference

August 23, 2007 (Peabody, Mass.) -- JEOL USA received a distinguished visitor at its Peabody, Massachusetts office on Tuesday, August 21st, when the 2007 Ernst Ruska Prize winner, Professor Hiroshi Jinnai of Kyoto Institute of Technology, visited JEOL’s U.S. headquarters. Dr. Jinnai, an invited speaker at the American Chemical Society Fall conference held in Boston during the week of August 20th, uses a JEOL Transmission Electron Microscope (TEM) in his nanomaterials research at the ...

New Microscopes Aid Wesleyan Researchers

Wesleyan’s Advanced Instrumentation Center has scoped out better way to conduct infinitesimal scientific research. In the past six months, the center has acquired a new, state-of-the art scanning electron microscope (JEOL JSM-6390LV SEM) for 3-D imaging, and a transmission electron microscope (JEOL JEM-1011 TEM) for 2-D sample images.

JEOL USA Completes “Super” Microprobe Installation at NIST

August 2, 2007 (Peabody, Mass.) -- JEOL USA, a leading supplier of electron microscopes and scientific instruments for nanotechnology, announced today that it has completed installation and acceptance of its first thermal field emission electron microprobe in the United States. The microprobe was installed at NIST in Gaithersburg, Maryland, in one of the world’s most technically advanced laboratories for developing new technologies and standards for a wide range of nanotechnology fields. A fully-automated, high-throughput versatile ...

Third Edition of Mass Spec Applications Booklet for Direct Analysis in Real Time (DART®)

June 25, 2007 (Peabody, Mass.) -- JEOL USA has recently published the third edition of its popular AccuTOF-DART Direct Analysis in Real Time mass spectrometry applications notebook. The updated booklet contains new data on chemical reaction monitoring and detection of the peroxide explosives TATP and HMTD. A compilation of 28 applications notes describes analyses performed using the AccuTOFTM time-of-flight mass spectrometer with the DART® ion source. Samples analyzed include pharmaceuticals, illicit drugs, foods, flavors, fragrances, industrial ...

Direct Write E-Beam Tool Extends JEOL’s Lithography Line

July 10, 2007 (Peabody, Mass.) -- JEOL USA has introduced a new high resolution direct write e-beam lithography system to complement its family of spot beam, vector scan systems and mask production tools. The new JBX-5500FS direct write lithography tool writes patterns at a minimum line width of 10nm at 50kV on up to 100mm substrates. The PC-controlled operating platform features a simple graphical user interface (GUI) for pattern design and machine control. Complete line of ...
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